SCHEMBL918864

SCHEMBL918864

CO[SiH2]CCC(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3415616 0.74
SCHEMBL15751388 0.74
SCHEMBL2109594 0.72
SCHEMBL28672253 0.72
SCHEMBL2108857 0.72
SCHEMBL625988 0.72
SCHEMBL8063911 0.72
SCHEMBL27944742 0.72
SCHEMBL6756473 0.72
SCHEMBL16883312 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114427126-A Preparation method of polyester monofilament for woven mesh cloth 南通新帝克单丝科技股份有限公司 2022-05-03 CN claimed
CN-108314411-B Method for preparing silicon dioxide aerogel composite material by chlorine-free and alcohol-free process 深圳中凝科技有限公司 2020-02-21 CN claimed
US-10516159-B2 Positive electrode active material for nonaqueous secondary battery NICHIA CORPORATION (JP) 2019-12-24 US claimed
CN-108314411-A The method that silicon dioxide silica aerogel composite material is prepared without alcohol technique using no chlorine 深圳中凝科技有限公司 2018-07-24 CN claimed
EP-0824127-B1 Water-type dispersion composition JSR CORP (JP) 2004-07-14 EP claimed
EP-0824127-A2 Water-type dispersion composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-02-18 EP claimed
CN-114427126-A Preparation method of polyester monofilament for woven mesh cloth 南通新帝克单丝科技股份有限公司 2022-05-03 CN disclosed
CN-108803266-B Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus 佳能株式会社 2022-03-15 CN disclosed
WO-2021256340-A1 RESIN FILM, METHOD FOR PRODUCING SAME, PRINTED WIRING BOARD, COVERLAY, AND MULTILAYER BODY 信越ポリマー株式会社 2021-12-23 WO disclosed
CN-113784838-A Resin film, high-frequency circuit board and method for producing same 信越聚合物株式会社 2021-12-10 CN disclosed
CN-111484021-B Preparation method of silicon dioxide aerogel 福建蓝烟新材料有限公司 2021-11-09 CN disclosed
US-11155717-B2 Storage container storing liquid composition and method for storing liquid composition FUJIFILM CORPORATION (JP) 2021-10-26 US disclosed
US-10935898-B2 Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus CANON KABUSHIKI KAISHA (JP) 2021-03-02 US disclosed
US-5401574-A A fluoropolymer and carbon fibers treated with a fluoroalkyl-containing silane NITTO DENKO CORPORATION (JP) 1995-03-28 US disclosed
US-5252685-A RTV organopolysiloxane compositions for use as cork chip binders and bonded cork chip articles SHIN-ETSU CHEMICAL CO., LTD. (JP) 1993-10-12 US disclosed
EP-0546522-A1 Sliding member and composition usable for the formation thereof NITTO DENKO CORPORATION (JP) 1993-06-16 EP disclosed
EP-0195292-B1 COATINGS FOR INK JET NOZZLES International Business Machines Corporation (US) 1989-10-25 EP disclosed
US-4643948-A Coatings for ink jet nozzles INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1987-02-17 US disclosed
EP-0195292-A2 Coatings for ink jet nozzles International Business Machines Corporation (US) 1986-09-24 EP disclosed
US-4394177-A Coating composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1983-07-19 US disclosed