SCHEMBL919093

SCHEMBL919093

COOC(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9687272 0.96
SCHEMBL9440400 0.96
SCHEMBL9545951 0.93
Acetonitrile SCHEMBL11673966 0.85
SCHEMBL28408897 0.81
SCHEMBL21694062 0.79
Bicarbonate SCHEMBL28078596 0.74 CA1 (0.36)
Hydrogen Peroxide SCHEMBL9436488 0.74 CA1 (0.40)
SCHEMBL30960095 0.74 CA1 (0.40)
SCHEMBL30514 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 92 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0640582-A2 Process for the preparation of methyle esters of aromatic methoxy carboxylic acids HOECHST AKTIENGESELLSCHAFT (DE) 1995-03-01 EP claimed
US-5084427-A Deodorizing with aluminum silicate molecular sieves UOP (US) 1992-01-28 US claimed
US-12415773-B1 Method of dimethyl carbonate production KING FAHD UNIVERSITY OF PETROLEUM AND MINERALS (SA) 2025-09-16 US disclosed
CN-117861725-A Imidazole ligand zirconium-based MOF catalyst and preparation method and application thereof 石河子大学 2024-04-12 CN disclosed
US-11333976-B2 Resin, photosensitive resin composition, electronic component and display device using the same TORAY INDUSTRIES, INC. (JP) 2022-05-17 US disclosed
CN-113527656-A Double-end chloroethoxy perfluoropolyether, application and preparation method of lithium battery electrolyte 天津科技大学 2021-10-22 CN disclosed
US-10189781-B2 Onium salt and composition comprising the same ASAHI KASEI E-MATERIALS CORPORATION (JP) 2019-01-29 US disclosed
CN-107849053-A Spiro compounds 卡利拉制药公司 2018-03-27 CN disclosed
CN-107406590-A Resin, photosensitive polymer combination and their electronic unit, display device are used 东丽株式会社 2017-11-28 CN disclosed
US-20160229801-A1 ONIUM SALT AND COMPOSITION COMPRISING THE SAME ASAHI KASEI E-MATERIALS CORPORATION (JP) 2016-08-11 US disclosed
US-9249082-B2 Synthesis of dimethyl carbonate from carbon dioxide and methanol King Abdulaziz City for Science and Technology (KACST) (SA) 2016-02-02 US disclosed
EP-0690520-A1 Rechargeable batteries CANON KABUSHIKI KAISHA (JP) 1996-01-03 EP disclosed
EP-0640582-A2 Process for the preparation of methyle esters of aromatic methoxy carboxylic acids HOECHST AKTIENGESELLSCHAFT (DE) 1995-03-01 EP disclosed
US-5084427-A Deodorizing with aluminum silicate molecular sieves UOP (US) 1992-01-28 US disclosed
US-5084427-A Deodorizing with aluminum silicate molecular sieves UOP (US) 1992-01-28 US disclosed
US-4916218-A 1-(β-D-xylofuranosyl)thymine derivatives BURROUGHS WELLCOME CO., A CORP. OF NC 1990-04-10 US disclosed
EP-0295090-A2 Chemical process THE WELLCOME FOUNDATION LIMITED (GB) 1988-12-14 EP disclosed
EP-0042161-B1 K-41.C(2) ESTERS AND COMPOSITIONS CONTAINING THEM Shionogi &amp; Co., Ltd. (JP) 1984-05-09 EP disclosed
US-4424212-A MITICIDES, ANTIPROTOZOA AGENTS, COCCIDIOSIS, POLYETHER ANTIBIOTICS SHIONOGI & CO., LTD. (JP) 1984-01-03 US disclosed
EP-0042161-A1 K-41.C(2) Esters and compositions containing them Shionogi &amp; Co., Ltd. (JP) 1981-12-23 EP disclosed