⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL919229 | 1.00 | — | — | |
| SCHEMBL169005 | 0.87 | — | — | |
| SCHEMBL346920 | 0.87 | — | — | |
| SCHEMBL149662 | 0.87 | — | — | |
| Methane SCHEMBL25325787 | 0.75 | — | — | |
| SCHEMBL117083 | 0.75 | — | — | |
| SCHEMBL1407167 | 0.75 | — | — | |
| SCHEMBL5881475 | 0.75 | — | — | |
| SCHEMBL591991 | 0.75 | — | — | |
| SCHEMBL8961882 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7872333-B2 | Layer system comprising a silicon layer and a passivation layer, method for production a passivation layer on a silicon layer and the use of said system and method | ROBERT BOSCH GMBH (DE) | 2011-01-18 | — | — | US | claimed |
| US-20060108576-A1 | Layer system comprising a silicon layer and a passivation layer, method for production a passivation layer on a silicon layer and the use of said system and method | ROBERT BOSCH GMBH (DE) | 2006-05-25 | — | — | US | claimed |
| US-7872333-B2 | Layer system comprising a silicon layer and a passivation layer, method for production a passivation layer on a silicon layer and the use of said system and method | ROBERT BOSCH GMBH (DE) | 2011-01-18 | — | — | US | disclosed |
| US-7745673-B2 | Processes for producing hydrohalocarbon and halocarbon compounds using silicon tetrafluoride | INTERNATIONAL ISOTOPES INC. (US) | 2010-06-29 | — | — | US | disclosed |
| WO-2009032849-A1 | PROCESSES FOR PRODUCING HYDROHALOCARBON AND HALOCARBON COMPOUNDS USING SILICON TETRAFLUORIDE | INTERNATIONAL ISOTOPES INC. (US) | 2009-03-12 | — | — | WO | disclosed |
| US-20090069589-A1 | PROCESSES FOR PRODUCING HYDROHALOCARBON AND HALOCARBON COMPOUNDS USING SILICON TETRAFLUORIDE | INTERNATIONAL ISOTOPES INC. (US) | 2009-03-12 | — | — | US | disclosed |
| US-20060108576-A1 | Layer system comprising a silicon layer and a passivation layer, method for production a passivation layer on a silicon layer and the use of said system and method | ROBERT BOSCH GMBH (DE) | 2006-05-25 | — | — | US | disclosed |
| US-6499492-B1 | Plasma process apparatus with in situ monitoring, monitoring method, and in situ residue cleaning | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-12-31 | — | — | US | disclosed |
| US-6146492-A | Plasma process apparatus with in situ monitoring, monitoring method, and in situ residue cleaning method | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2000-11-14 | — | — | US | disclosed |