⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9248112 | 0.81 | — | — | |
| SCHEMBL5157578 | 0.73 | CHRM2 (0.34) | — | |
| SCHEMBL6221110 | 0.73 | NPC1 (0.30) | — | |
| SCHEMBL20141501 | 0.72 | CHRM2 (0.32) | — | |
| SCHEMBL20141503 | 0.72 | CHRM2 (0.32) | — | |
| SCHEMBL20141502 | 0.72 | CHRM2 (0.32) | — | |
| SCHEMBL16827257 | 0.70 | — | — | |
| SCHEMBL5849594 | 0.70 | — | — | |
| SCHEMBL7931705 | 0.70 | — | — | |
| SCHEMBL15100360 | 0.68 | SMN1; SMN2 (0.41) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 108 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230049294-A1 | STEREOSELECTIVE PROCESS OF MANUFACTURE OF PURINE PHOSPHORAMIDATES | Atea Pharmaceuticals, Inc. (US) | 2023-02-16 | — | — | US | claimed |
| WO-2021216722-A1 | STEREOSELECTIVE PROCESS OF MANUFACTURE OF PURINE PHOSPHORAMIDATES | Atea Pharmaceuticals, Inc. (US) | 2021-10-28 | — | — | WO | claimed |
| US-5475010-A | Vaginal infections | GRUPPO LEPETIT S.P.A. (IT) | 1995-12-12 | — | — | US | claimed |
| EP-0641346-A1 | 7'-AMINO-NAPHTHAZARIN ANTIBIOTIC DERIVATIVES. | LEPETIT SPA (IT) | 1995-03-08 | — | — | EP | claimed |
| WO-1993012115-A1 | 7'-AMINO-NAPHTHAZARIN ANTIBIOTIC DERIVATIVES | GRUPPO LEPETIT S.P.A. (IT) | 1993-06-24 | — | — | WO | claimed |
| US-12551499-B2 | Highly active compounds against COVID-19 | Atea Pharmaceuticals, Inc. (US) | 2026-02-17 | — | — | US | disclosed |
| EP-4604951-A1 | 1-(SULFONYL)-N-PHENYLPYRROLIDINE-2-CARBOXAMIDES DERIVATIVES AND USE THEREOF | AMIRA THERAPEUTICS, S.L. (ES) | 2025-08-27 | — | — | EP | disclosed |
| CN-113784721-B | High activity compounds against COVID-19 | 阿堤亚制药公司 | 2025-06-13 | — | — | CN | disclosed |
| CN-119139338-A | High activity compounds against COVID-19 | 阿堤亚制药公司 | 2024-12-17 | — | — | CN | disclosed |
| CN-118948877-A | High activity compounds against COVID-19 | 阿堤亚制药公司 | 2024-11-15 | — | — | CN | disclosed |
| US-20240261316-A1 | HIGHLY ACTIVE COMPOUNDS AGAINST COVID-19 | Atea Pharmaceuticals, Inc. | 2024-08-08 | — | — | US | disclosed |
| US-12006311-B2 | Compounds for use in preventing or treating cancer | FUNDACIÓ HOSPITAL UNIVERSITARI VALL D'HEBRONINSTITUT DE RECERCA (ES) | 2024-06-11 | — | — | US | disclosed |
| US-20030022102-A1 | Method of manufacturing composite member, photosensitive composition, porous base material, insulating body and composite member | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-01-30 | — | — | US | disclosed |
| US-20020098441-A1 | Resin useful for resist, resist composition and pattern forming process using the same | KABUSHIKI KAISHA TOSHIBA (JP) | 2002-07-25 | — | — | US | disclosed |
| US-6303266-B1 | FOR PATTERN HAVING TRANSPARENCY AGAINST SHORT-WAVELENGTH LIGHT AND DRY-ETCHING RESISTANCE CAN BE FORMED BY ALKALI DEVELOPMENT WITH HIGH RESOLUTION | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-10-16 | — | — | US | disclosed |
| US-6280897-B1 | GENERATION OF ACID WITH ACTINIC RADIATION | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-08-28 | — | — | US | disclosed |
| US-6071670-A | PHOTORESIST RESIN COMPRISING PHOTOACID GENERATING COMPOUND AND AN ACID HYDROLYZABLE OLIGOMER HAVING ALICYCLIC OR POLYCONDENSED AROMATIC BACKBONE; ALKALI DEVELOPMENT WITH HIGH RESOLUTION, DRY ETCH RESISTANCE | KABUSHIKI KAISHA TOSHIBA (JP) | 2000-06-06 | — | — | US | disclosed |
| US-6060207-A | LOW IN ABSORPTION OF A LIGHT SOURCE OF SHORT WAVELENGTH AND EXCELLENT IN DRY ETCH RESISTANCE; COMPRISES A COMPOUND HAVING A TERPENOID SKELETON | KABUSHIKI KAISHA TOSHIBA (JP) | 2000-05-09 | — | — | US | disclosed |
| US-5932391-A | CONTAINING AN ACYCLIC COMPOUND WHICH IS A VINYL POLYMERBEING LIGHT ABSORBENT | KABUSHIKI KAISHA TOSHIBA (JP) | 1999-08-03 | — | — | US | disclosed |
| US-5863699-A | FORMS A PATTERN THROUGH LIGHT-EXPOSURE WITH EITHER ARGON FLUORIDE OR FLUORINE EXCIMER LASERS, COMPRISES A COMPOUND HAVING EITHER AN ACID-DECOMPOSABLE OR ACID-CROSSLINKABLE GROUP | KABUSHIKI KAISHA TOSHIBA (JP) | 1999-01-26 | — | — | US | disclosed |