⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14876768 | 0.96 | — | — | |
| SCHEMBL17244 | 0.96 | — | — | |
| SCHEMBL28534948 | 0.93 | — | — | |
| SCHEMBL28825030 | 0.93 | — | — | |
| SCHEMBL5899334 | 0.93 | — | — | |
| Bromide SCHEMBL10701347 | 0.93 | — | — | |
| Hydrochloric Acid SCHEMBL122329 | 0.93 | — | — | |
| Benzene SCHEMBL29096572 | 0.90 | — | — | |
| Ammonia Solution, Strong SCHEMBL28644722 | 0.90 | — | — | |
| Hno SCHEMBL3004782 | 0.87 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106543065-B | A kind of 4- trifluoromethyl -2,4- bis- replaces -2,5- dihydro pyrrole derivates and its preparation method and application | 华东师范大学 | 2019-06-11 | — | — | CN | disclosed |
| CN-105481748-B | Polysubstituted dihydro pyrrole derivates of 5- fluorine and preparation method thereof | 华东师范大学 | 2018-05-15 | — | — | CN | disclosed |
| CN-106543065-A | 2,4 2 replacement of a kind of 4 trifluoromethyl, 2,5 dihydro pyrrole derivates and its preparation method and application | 华东师范大学 | 2017-03-29 | — | — | CN | disclosed |
| CN-105481748-A | 5-fluoro polysubstituted pyrroline derivative and preparation method thereof | UNIV EAST CHINA NORMAL | 2016-04-13 | — | — | CN | disclosed |
| EP-2475000-B1 | PROCESSING AGENT COMPOSITION FOR SEMICONDUCTOR SURFACE AND METHOD FOR PROCESSING SEMICONDUCTOR SURFACE USING SAME | WAKO PURE CHEM IND LTD (JP) | 2015-07-01 | — | — | EP | disclosed |
| US-9034810-B2 | Processing agent composition for semiconductor surface and method for processing semiconductor surface using same | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2015-05-19 | — | — | US | disclosed |
| US-8828918-B2 | Semiconductor surface treating agent composition and method for treating semiconductor surface using the semiconductor surface treating agent composition | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2014-09-09 | — | — | US | disclosed |
| EP-2249206-B1 | SEMICONDUCTOR SURFACE TREATING AGENT COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SURFACE USING THE SEMICONDUCTOR SURFACE TREATING AGENT COMPOSITION | WAKO PURE CHEM IND LTD (JP) | 2014-07-02 | — | — | EP | disclosed |
| EP-2475000-A1 | PROCESSING AGENT COMPOSITION FOR SEMICONDUCTOR SURFACE AND METHOD FOR PROCESSING SEMICONDUCTOR SURFACE USING SAME | Wako Pure Chemical Industries, Ltd. (JP) | 2012-07-11 | — | — | EP | disclosed |
| US-20120157368-A1 | PROCESSING AGENT COMPOSITION FOR SEMICONDUCTOR SURFACE AND METHOD FOR PROCESSING SEMICONDUCTOR SURFACE USING SAME | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2012-06-21 | — | — | US | disclosed |
| US-20110021400-A1 | SEMICONDUCTOR SURFACE TREATING AGENT COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SURFACE USING THE SEMICONDUCTOR SURFACE TREATING AGENT COMPOSITION | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2011-01-27 | — | — | US | disclosed |
| EP-2249206-A1 | SEMICONDUCTOR SURFACE TREATING AGENT COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SURFACE USING THE SEMICONDUCTOR SURFACE TREATING AGENT COMPOSITION | Wako Pure Chemical Industries, Ltd. (JP) | 2010-11-10 | — | — | EP | disclosed |