Formaldehyde

Formaldehyde

SCHEMBL9253985

C=O.F

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Formaldehyde SCHEMBL16668714 1.00
Formaldehyde SCHEMBL27567469 0.89
Formaldehyde SCHEMBL9666368 0.89
Formaldehyde SCHEMBL27993689 0.89
Formaldehyde SCHEMBL6977718 0.87
Formaldehyde SCHEMBL268 0.87
Formaldehyde SCHEMBL13582711 0.87
Formaldehyde SCHEMBL12190180 0.87
Formaldehyde SCHEMBL3907789 0.87
Formaldehyde SCHEMBL8330944 0.87

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 70 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118344634-B Fluorine-containing formaldehyde-based piperidine type anion exchange membrane and preparation method thereof 大连理工大学 2024-09-10 CN claimed
CN-117211092-A Low-formaldehyde fluorine-free non-ironing single anti-single-suction finishing process for woven fabric 鲁丰织染有限公司 2023-12-12 CN claimed
CN-109608048-A Sintered body with conductive coating 肖特股份有限公司 2019-04-12 CN claimed
CN-107848919-A Process for drying hydro (chloro) fluoroolefins 墨西哥氟石股份公司 2018-03-27 CN claimed
US-20140183522-A1 THIN FILM TRANSISTOR, THIN FILM TRANSISTOR ARRAY PANEL INCLUDING THE SAME AND MANUFACTURING METHOD THEREOF SAMSUNG DISPLAY CO., LTD. (KR) 2014-07-03 US claimed
CN-101256977-B Semiconductor structure and method for forming semiconductor structure TAIWAN SEMICONDUCTOR MFG 2013-06-26 CN claimed
CN-1639643-B Device, EUV-lithographic device and method for preventing and cleaning contamination on optical elements ZEISS CARL SMT AG 2011-08-03 CN claimed
CN-101256977-A Semiconductor structure and method for forming semiconductor structure TAIWAN SEMICONDUCTOR MFG (CN) 2008-09-03 CN claimed
CN-1639643-A Device, EUV-lithographic device and method for preventing and cleaning contamination on optical elements ZEISS CARL SMT AG (DE) 2005-07-13 CN claimed
CN-1045952-C Chemical Process ICI PLC (GB) 1999-10-27 CN claimed
CN-1079729-A Produce the method for two (fluoro methyl) ethers and methylene fluoride ICI PLC (GB) 1993-12-22 CN claimed
JP-3275860-A None JP disclosed
CN-117211092-B Low-formaldehyde fluorine-free non-ironing single anti-single-suction finishing process for woven fabric 鲁丰织染有限公司 2025-11-28 CN disclosed
CN-117211092-B Low-formaldehyde fluorine-free non-ironing single anti-single-suction finishing process for woven fabric 鲁丰织染有限公司 2025-11-28 CN disclosed
CN-118344634-B Fluorine-containing formaldehyde-based piperidine type anion exchange membrane and preparation method thereof 大连理工大学 2024-09-10 CN disclosed
US-5386064-A Contacting formaldehyde with hydrogen fluoride in the presence of a water-immiscible solvent for the product IMPERIAL CHEMICAL INDUSTRIES PLC (GB) 1995-01-31 US disclosed
CN-1083467-A The preparation of two (methyl fluoride) ethers and methylene fluoride ICI PLC (GB) 1994-03-09 CN disclosed
CN-1079729-A Produce the method for two (fluoro methyl) ethers and methylene fluoride ICI PLC (GB) 1993-12-22 CN disclosed
WO-1993022265-A1 PRODUCTION OF BIS(FLUOROMETHYL)ETHER AND DIFLUOROMETHANE IMPERIAL CHEMICAL INDUSTRIES PLC (GB) 1993-11-11 WO disclosed
JP-H03275860-A CONTAMINATION-PREVENTING METHOD FOR VINYL CHLORIDE WALLPAPER ASAHI GLASS CO LTD 1991-12-06 JP disclosed