⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9256714 | 0.93 | EPHX1 (0.47) | — | |
| SCHEMBL5376228 | 0.91 | EPHX1 (0.50) | — | |
| SCHEMBL10336043 | 0.91 | EPHX1 (0.50) | — | |
| SCHEMBL8057455 | 0.91 | EPHX1 (0.50) | — | |
| SCHEMBL9255631 | 0.90 | EPHX1 (0.35) | — | |
| SCHEMBL5264819 | 0.88 | — | — | |
| SCHEMBL9257830 | 0.88 | EPHX1 (0.34) | — | |
| SCHEMBL9264947 | 0.86 | CYP1A2 (0.36) | — | |
| SCHEMBL68356 | 0.84 | EPHX1 (0.38) | — | |
| SCHEMBL25228744 | 0.82 | EPHX1 (0.41) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 95 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10591816-B2 | Photosensitive resin composition, color filter, and liquid crystal display element thereof | CHI MEI CORPORATION (TW) | 2020-03-17 | — | — | US | disclosed |
| CN-110320755-A | Minus white photosensitive resin composition and its application | 奇美实业股份有限公司 | 2019-10-11 | — | — | CN | disclosed |
| CN-105093832-B | Photosensitive composition, protective film and element having protective film | 奇美实业股份有限公司 | 2019-08-30 | — | — | CN | disclosed |
| CN-104423170-B | Photosensitive polysiloxane composition, protective film and assembly with protective film | 奇美实业股份有限公司 | 2019-05-24 | — | — | CN | disclosed |
| CN-104345567-B | photosensitive polysiloxane composition and application thereof | 奇美实业股份有限公司 | 2019-04-02 | — | — | CN | disclosed |
| CN-109116681-A | Chemically amplified positive photosensitive resin composition, photoresist pattern and method for forming the same, and electronic device | 奇美实业股份有限公司 | 2019-01-01 | — | — | CN | disclosed |
| US-10162260-B2 | Photosensitive resin composition, protective film, and liquid crystal display element | CHI MEI CORPORATION (TW) | 2018-12-25 | — | — | US | disclosed |
| CN-109062007-A | positive photosensitive polysiloxane composition and application thereof | 奇美实业股份有限公司 | 2018-12-21 | — | — | CN | disclosed |
| CN-104423168-B | Positive photosensitive resin composition and pattern forming method thereof | 奇美实业股份有限公司 | 2018-11-30 | — | — | CN | disclosed |
| CN-108693710-A | Positive photosensitive polysiloxane composition | 奇美实业股份有限公司 | 2018-10-23 | — | — | CN | disclosed |
| US-20130310497-A1 | PHOTO-CURING POLYSILOXANE COMPOSITION AND APPLICATIONS THEREOF | CHI MEI CORPORATION (TW) | 2013-11-21 | — | — | US | disclosed |
| CN-103376661-A | Photocurable polysiloxane composition, protective film and element having protective film | CHI MEI COR | 2013-10-30 | — | — | CN | disclosed |
| US-20130280541-A1 | PHOTO-CURING POLYSILOXANE COMPOSITION AND APPLICATION THEREOF | CHI MEI CORPORATION (TW) | 2013-10-24 | — | — | US | disclosed |
| US-20130260108-A1 | PHOTO-CURING POLYSILOXAN COMPOSITION AND APPLICATIONS THEREOF | CHI MEI CORPORATION (TW) | 2013-10-03 | — | — | US | disclosed |
| EP-2615497-A1 | RESIST PATTERN FORMING METHOD | JSR Corporation (JP) | 2013-07-17 | — | — | EP | disclosed |
| US-20120183908-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2012-07-19 | — | — | US | disclosed |
| US-5455355-A | Postemergence, preemergence herbicides | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1995-10-03 | — | — | US | disclosed |
| US-5298632-A | Herbicidal pyrimidine compounds, compositions containing the same and method of use | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1994-03-29 | — | — | US | disclosed |
| US-5232897-A | Herbicidal pyrimidine compounds, compositions containing the same and method of use | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1993-08-03 | — | — | US | disclosed |
| EP-0457505-A2 | Pyrimidine derivatives and their use as herbicides | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-11-21 | — | — | EP | disclosed |