Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 3/20 | 0.67 |
| ▸ | MAPT | P10636 | 2/20 | 0.59 |
| ▸ | MEN1 | O00255 | 2/20 | 0.59 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.59 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.59 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.59 |
| ▸ | UGT1A1 | P22309 | 1/20 | 0.59 |
| ▸ | SQLE | Q14534 | 3/20 | 0.57 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.53 |
| ▸ | FNTA | P49354 | 1/20 | 0.53 |
| ▸ | FNTB | P49356 | 1/20 | 0.53 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL929379 | 1.00 | KMT2A (0.67) | KMT2AMAPTMEN1CYP3A4ALOX15 | |
| SCHEMBL929378 | 1.00 | KMT2A (0.67) | KMT2AMAPTMEN1CYP3A4ALOX15 | |
| SCHEMBL18538780 | 0.90 | KMT2A (0.59) | KMT2AMAPTMEN1CYP3A4ALOX15 | |
| SCHEMBL8978505 | 0.85 | KMT2A (0.64) | KMT2AMAPTMEN1CYP3A4ALOX15 | |
| SCHEMBL2495546 | 0.85 | KMT2A (0.64) | KMT2AMAPTMEN1CYP3A4ALOX15 | |
| SCHEMBL2495543 | 0.85 | KMT2A (0.64) | KMT2AMAPTMEN1CYP3A4ALOX15 | |
| SCHEMBL16125783 | 0.85 | KMT2A (0.64) | KMT2AMAPTMEN1CYP3A4ALOX15 | |
| SCHEMBL8978471 | 0.85 | KMT2A (0.64) | KMT2AMAPTMEN1CYP3A4ALOX15 | |
| SCHEMBL2496380 | 0.85 | KMT2A (0.64) | KMT2AMAPTMEN1CYP3A4ALOX15 | |
| SCHEMBL2496377 | 0.85 | KMT2A (0.64) | KMT2AMAPTMEN1CYP3A4ALOX15 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7875408-B2 | comprising photobleachable organic materials can be bleached by 193 nm light, and brought back to their original state by stimuli after exposure; to improve the aerial image effectively seen by the photoresist and thereby improve the contrast | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-01-25 | — | — | US | disclosed |
| US-20080182178-A1 | Bleachable materials for lithography | GLOBALFOUNDRIES U.S. INC. | 2008-07-31 | — | — | US | disclosed |