⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2991960 | 0.86 | — | — | |
| SCHEMBL1271215 | 0.86 | — | — | |
| SCHEMBL13089364 | 0.84 | — | — | |
| SCHEMBL308366 | 0.84 | — | — | |
| SCHEMBL930678 | 0.81 | — | — | |
| SCHEMBL143500 | 0.79 | — | — | |
| SCHEMBL15015536 | 0.78 | — | — | |
| SCHEMBL12898522 | 0.78 | — | — | |
| SCHEMBL10298089 | 0.77 | — | — | |
| SCHEMBL4081159 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2272878-B1 | Coupled polymers and manufacturing method thereof | TSRC CORP (TW) | 2013-12-18 | — | — | EP | claimed |
| US-8481649-B2 | Coupled polymers and manufacturing method thereof | TSRC CORPORATION (TW) | 2013-07-09 | — | — | US | claimed |
| US-20110009588-A1 | COUPLED POLYMERS AND MANUFACTURING METHOD THEREOF | TSRC CORPORATION (TW) | 2011-01-13 | — | — | US | claimed |
| EP-2272878-A1 | Coupled polymers and manufacturing method thereof | TSRC Corporation (TW) | 2011-01-12 | — | — | EP | claimed |
| EP-2272878-B1 | Coupled polymers and manufacturing method thereof | TSRC CORP (TW) | 2013-12-18 | — | — | EP | disclosed |
| US-8481649-B2 | Coupled polymers and manufacturing method thereof | TSRC CORPORATION (TW) | 2013-07-09 | — | — | US | disclosed |
| CN-102212196-B | Coupled copolymer and method for producing the same | TSRC CORP | 2013-03-06 | — | — | CN | disclosed |
| US-20110042789-A1 | MATERIAL FOR CHEMICAL VAPOR DEPOSITION, SILICON-CONTAINING INSULATING FILM AND METHOD FOR PRODUCTION OF THE SILICON-CONTAINING INSULATING FILM | JSR CORPORATION (JP) | 2011-02-24 | — | — | US | disclosed |
| US-20110009588-A1 | COUPLED POLYMERS AND MANUFACTURING METHOD THEREOF | TSRC CORPORATION (TW) | 2011-01-13 | — | — | US | disclosed |
| EP-2272878-A1 | Coupled polymers and manufacturing method thereof | TSRC Corporation (TW) | 2011-01-12 | — | — | EP | disclosed |
| EP-2264219-A1 | MATERIAL FOR CHEMICAL VAPOR DEPOSITION, SILICON-CONTAINING INSULATING FILM AND PROCESS FOR PRODUCTION THEREOF | JSR Corporation (JP) | 2010-12-22 | — | — | EP | disclosed |