⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6706860 | 1.00 | — | — | |
| SCHEMBL2956127 | 1.00 | — | — | |
| SCHEMBL6709894 | 1.00 | — | — | |
| SCHEMBL3229737 | 1.00 | — | — | |
| SCHEMBL3235533 | 1.00 | — | — | |
| SCHEMBL6707421 | 1.00 | — | — | |
| SCHEMBL703802 | 0.97 | — | — | |
| SCHEMBL23658246 | 0.92 | TSHR (0.42) | — | |
| SCHEMBL5574596 | 0.92 | TSHR (0.42) | — | |
| SCHEMBL14910494 | 0.92 | TSHR (0.42) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2586832-B1 | ENCAPSULANT FOR OPTICAL SEMICONDUCTOR DEVICE AND OPTICAL SEMICONDUCTOR DEVICE USING SAME | SEKISUI CHEMICAL CO LTD (JP) | 2014-10-29 | — | — | EP | disclosed |
| US-8603588-B2 | Composition and method for production thereof, porous material and method for production thereof, interlayer insulating film, semiconductor material, semiconductor device, and low-refractive-index surface protection film | MITSUI CHEMICALS, INC. (JP) | 2013-12-10 | — | — | US | disclosed |
| US-8519429-B2 | Encapsulant for optical semiconductor device and optical semiconductor device using same | SEKISUI CHEMICAL CO., LTD. (JP) | 2013-08-27 | — | — | US | disclosed |
| EP-2586832-A1 | ENCAPSULANT FOR OPTICAL SEMICONDUCTOR DEVICE AND OPTICAL SEMICONDUCTOR DEVICE USING SAME | Sekisui Chemical Co., Ltd. (JP) | 2013-05-01 | — | — | EP | disclosed |
| EP-2581954-A1 | DIE-BONDING MATERIAL FOR OPTICAL SEMICONDUCTOR DEVICES AND OPTICAL SEMICONDUCTOR DEVICE USING SAME | Sekisui Chemical Co., Ltd. (JP) | 2013-04-17 | — | — | EP | disclosed |
| EP-2554601-A1 | SEALANT FOR OPTICAL SEMICONDUCTORS AND OPTICAL SEMICONDUCTOR DEVICE | Sekisui Chemical Co., Ltd. (JP) | 2013-02-06 | — | — | EP | disclosed |
| US-8304924-B2 | Composition for sealing semiconductor, semiconductor device, and process for producing semiconductor device | MITSUI CHEMICALS, INC. (JP) | 2012-11-06 | — | — | US | disclosed |
| US-20120153342-A1 | DIE-BONDING MATERIAL FOR OPTICAL SEMICONDUCTOR DEVICES AND OPTICAL SEMICONDUCTOR DEVICE USING SAME | SEKISUI CHEMICAL CO., LTD. (JP) | 2012-06-21 | — | — | US | disclosed |
| US-20120146088-A1 | ENCAPSULANT FOR OPTICAL SEMICONDUCTOR DEVICE AND OPTICAL SEMICONDUCTOR DEVICE USING SAME | SEKISUI CHEMICAL CO., LTD. (JP) | 2012-06-14 | — | — | US | disclosed |
| US-20120126282-A1 | SEALANT FOR OPTICAL SEMICONDUCTORS AND OPTICAL SEMICONDUCTOR DEVICE | SEKISUI CHEMICAL CO., LTD. (JP) | 2012-05-24 | — | — | US | disclosed |
| EP-2163664-A1 | Method for depositing si-containing film, insulator film, and semiconductor device | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-03-17 | — | — | EP | disclosed |
| US-20100061915-A1 | METHOD FOR DEPOSITING SI-CONTAINING FILM, INSULATOR FILM, AND SEMICONDUCTOR DEVICE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-03-11 | — | — | US | disclosed |
| US-20090294922-A1 | ORGANIC SILICON OXIDE FINE PARTICLE AND PREPARATION METHOD THEREOF, POROUS FILM-FORMING COMPOSITION, POROUS FILM AND FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE | PANASONIC CORPORATION (JP) | 2009-12-03 | — | — | US | disclosed |
| US-20090294726-A1 | ORGANIC SILICON OXIDE FINE PARTICLES AND PREPARATION METHOD THEREOF, POROUS FILM-FORMING COMPOSITION, POROUS FILM AND FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-12-03 | — | — | US | disclosed |
| US-20070178319-A1 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO, LTD. (JP) | 2007-08-02 | — | — | US | disclosed |
| EP-1564269-A1 | COMPOSITION FOR POROUS FILM FORMATION, POROUS FILM, PROCESS FOR PRODUCING THE SAME, INTERLAYER INSULATION FILM AND SEMICONDUCTOR DEVICE | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-08-17 | — | — | EP | disclosed |
| US-20040216641-A1 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-11-04 | — | — | US | disclosed |
| CN-1536023-A | Porous membrane shaping composition, preparation method of porous membrane, porous membrane intercalation insulating film and semiconductor device | ��Խ��ѧ��ҵ��ʽ���� | 2004-10-13 | — | — | CN | disclosed |
| US-20040028978-A1 | Proton conducting membrane, method for producing the same, and fuel cell using the same | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2004-02-12 | — | — | US | disclosed |
| EP-1334993-A2 | Proton conducting membrane, method for producing the same, and fuel cell using the same | National Institute of Advanced Industrial Science and Technology (JP) | 2003-08-13 | — | — | EP | disclosed |