⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5552244 | 0.74 | — | — | |
| SCHEMBL332951 | 0.73 | — | — | |
| SCHEMBL25253504 | 0.69 | — | — | |
| SCHEMBL4784549 | 0.69 | — | — | |
| SCHEMBL25244024 | 0.69 | — | — | |
| SCHEMBL706109 | 0.67 | — | — | |
| SCHEMBL705251 | 0.67 | — | — | |
| SCHEMBL20912515 | 0.66 | — | — | |
| SCHEMBL7608550 | 0.65 | — | — | |
| SCHEMBL29901177 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11999827-B2 | Polycarbosilazane, and composition comprising the same, and method for producing silicon-containing film using the same | MERCK PATENT GMBH (DE) | 2024-06-04 | — | — | US | disclosed |
| EP-4146725-B1 | POLYCARBOSILAZANE, AND COMPOSITION COMPRISING THE SAME, AND METHOD FOR PRODUCING SILICON-CONTAINING FILM USING THE SAME | MERCK PATENT GMBH (DE) | 2024-05-22 | — | — | EP | disclosed |
| US-20230174724-A1 | POLYCARBOSILAZANE, AND COMPOSITION COMPRISING THE SAME, AND METHOD FOR PRODUCING SILICON-CONTAINING FILM USING THE SAME | MERCK PATENT GMBH (DE) | 2023-06-08 | — | — | US | disclosed |
| CN-115605530-A | Polycarbosilazanes, compositions comprising the same, and methods of making silicon-containing films using the same | 默克专利有限公司（DE） | 2023-01-13 | — | — | CN | disclosed |
| EP-0372379-B1 | Chlorinated silizane polymers, process for their preparation, process for the preparation of silicon nitride-containing ceramic materials | HOECHST AG (DE) | 1994-08-10 | — | — | EP | disclosed |
| US-5100975-A | CHLORINE-CONTAINING SILAZANE POLYMERS, PROCESS FOR THEIR PREPARATION, CERAMIC MATERIAL CONTAINING SILICON NITRIDE WHICH CAN BE PREPARED FROM THEM, AND THEIR PREPARATION | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-03-31 | — | — | US | disclosed |
| US-5032663-A | Chlorine-containing silazane polymers, process for their preparation, ceramic materials containing silicon nitride which can be prepared from them, and their preparation | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-07-16 | — | — | US | disclosed |