Fluoride

Fluoride

SCHEMBL9347404

F.F.F.F.F.F.[SiH3][SiH3].[SiH3][SiH3].[SiH3][SiH3].[SiH3][SiH3].[SiH3][SiH3].[SiH3][SiH3]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride SCHEMBL9347415 1.00
SCHEMBL27801878 0.82
SCHEMBL276330 0.67
SCHEMBL9764920 0.67
SCHEMBL1496192 0.67
Phosphine SCHEMBL23752071 0.67
SCHEMBL6546467 0.67
Hydrochloric Acid SCHEMBL3301669 0.67 CA4 (0.33)
SCHEMBL10710901 0.67
SCHEMBL27677503 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-62062529-A None JP disclosed
EP-0284693-B1 Low temperature, plasma method of making plasma deposited coatings ENERGY CONVERSION DEVICES INC (US) 1994-08-31 EP disclosed
EP-0284693-A2 Low temperature, plasma method of making plasma deposited coatings ENERGY CONVERSION DEVICES, INC. (US) 1988-10-05 EP disclosed
US-4737379-A VACUUM DEPOSITION USING MICROWAVES ENERGY CONVERSION DEVICES, INC. (US) 1988-04-12 US disclosed
JP-S6262529-A FORMING METHOD FOR SILICON NITRIDE FILM TOPPAN PRINTING CO LTD 1987-03-19 JP disclosed