SCHEMBL93519

SCHEMBL93519

C=CC(=O)OCC1CCC(CO)CC1

nearest known ligand 0.45

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.45
ALDH1A1 P00352 4/20 0.41
TP53 P04637 3/20 0.41
HIF1A Q16665 3/20 0.41
CYP3A4 P08684 2/20 0.41
MAPK1 P28482 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
HSD17B10 Q99714 1/20 0.41
HPGD P15428 1/20 0.37
THRB P10828 3/20 0.33
LMNA P02545 1/20 0.33
THRA P10827 1/20 0.33
SLC1A3 P43003 2/20 0.30
SLC1A2 P43004 2/20 0.30
SLC1A1 P43005 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20685518 1.00 TSHR (0.45) TSHRALDH1A1TP53HIF1ACYP3A4
Cyclohexane SCHEMBL956112 0.96 TSHR (0.42) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL6557409 0.92 TSHR (0.46) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL3678063 0.92
SCHEMBL421446 0.92 TSHR (0.46) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL5933913 0.91 TSHR (0.44) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL23837211 0.86 TSHR (0.42) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL12154290 0.86 TSHR (0.42) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL1963100 0.86 TSHR (0.42) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL280546 0.85 TSHR (0.41) TSHRALDH1A1TP53HIF1ACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2003 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260092188-A1 Radiation Curable Ink Composition For Ink Jet And Ink Jet Recording Method SEIKO EPSON CORP (JP) 2026-04-02 US claimed
EP-3266752-B1 SILICA GLASS PRECURSOR PRODUCTION METHOD, SILICA GLASS PRECURSOR, SILICA GLASS PRODUCTION METHOD UNIV KYUSHU NAT UNIV CORP (JP) 2024-07-10 EP claimed
CN-118016891-A Binder composition for secondary battery 广东省皓智科技有限公司 2024-05-10 CN claimed
CN-114342124-B Binder composition for secondary battery 广东省皓智科技有限公司 2024-04-09 CN claimed
CN-117285877-A Optical adhesive, preparation method and application thereof 广州鹿山新材料股份有限公司 2023-12-26 CN claimed
CN-117264543-A Optical cement, preparation method thereof and touch display screen 广州鹿山新材料股份有限公司 2023-12-22 CN claimed
CN-117120925-A Photosensitive laminate and method for manufacturing circuit board using the same 可隆工业株式会社 2023-11-24 CN claimed
EP-4263731-A1 UV CURABLE INKJET INKS AND INKJET PRINTING METHODS AGFA NV (BE) 2023-10-25 EP claimed
CN-116745698-A Photosensitive laminate, method for producing photosensitive laminate, and method for producing circuit board 可隆工业株式会社 2023-09-12 CN claimed
CN-116583571-A UV curable inkjet inks and inkjet printing methods 爱克发有限公司 2023-08-11 CN claimed
US-20120142848-A1 METHODS FOR PRODUCING CROSSLINKABLE OLIGOMERS NUPLEX RESINS B.V. (NL) 2012-06-07 US claimed
US-20100240824-A1 POWDER COATING SUSPENSIONS (POWDER SLURRIES) AND POWDER COATING MATERIALS, THEIR PREPARATION AND USE BASF COATINGS AG (DE) 2010-09-23 US claimed
EP-1889857-B1 NOVEL PACKING MATERIAL WITH EXCELLENT HYDROPHILICITY AND PROCESS FOR PRODUCING THE SAME TOSOH CORP (JP) 2010-07-21 EP claimed
US-20100029914-A1 NOVEL PACKING MATERIAL WITH EXCELLENT HYDROPHILICITY AND PROCESS FOR PRODUCING THE SAME TOSOH CORPORATION (JP) 2010-02-04 US claimed
EP-1784435-B1 METHODS FOR PRODUCING CROSSLINKABLE OLIGOMERS NUPLEX RESINS BV (NL) 2009-11-11 EP claimed
US-20080114125-A1 Methods for Producing Crosslinkable Oligomers NUPLEX RESINS B.V. (NL) 2008-05-15 US claimed
EP-1889857-A1 NOVEL PACKING MATERIAL WITH EXCELLENT HYDROPHILICITY AND PROCESS FOR PRODUCING THE SAME Tosoh Corporation (JP) 2008-02-20 EP claimed
US-20070066777-A1 Methods for producing crosslinkable oligomers NUPLEX RESINS, B.V. (NL) 2007-03-22 US claimed
US-7067584-B2 Solvent-containing coating material and the use thereof BASF COATINGS AG (DE) 2006-06-27 US claimed
US-20040019142-A1 Solvent-containing coating material and the use thereof RINK HEINZ-PETER (DE) 2004-01-29 US claimed