SCHEMBL9356567

SCHEMBL9356567

c1ccc(C2=NN(c3ccccc3-c3ccccc3)C(c3ccccc3)C2)cc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 10/20 0.57
▸ KMT2A Q03164 10/20 0.57
▸ L3MBTL1 Q9Y468 2/20 0.57
▸ MAOB P27338 3/20 0.56
▸ MAOA P21397 2/20 0.56
▸ ATM Q13315 4/20 0.54
▸ KDM4E B2RXH2 3/20 0.54
▸ ALDH1A1 P00352 3/20 0.54
▸ GAA P10253 3/20 0.54
▸ GLA P06280 2/20 0.54
▸ MAPT P10636 2/20 0.54
▸ HTT P42858 1/20 0.54
▸ GFER P55789 1/20 0.54
▸ CA1 P00915 1/20 0.54
▸ CA2 P00918 1/20 0.54
▸ CFTR P13569 1/20 0.54
▸ HPGD P15428 1/20 0.54
▸ GOPC Q9HD26 1/20 0.54
▸ HSP90AA1 P07900 2/20 0.54
▸ PRKCZ Q05513 2/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL395608 0.82 MEN1 (0.73) MEN1KMT2AL3MBTL1MAOBMAOA
SCHEMBL23052404 0.82 MEN1 (0.73) MEN1KMT2AL3MBTL1MAOBMAOA
SCHEMBL10361833 0.80 MEN1 (0.69) MEN1KMT2AL3MBTL1MAOBMAOA
SCHEMBL14338087 0.79 MEN1 (0.69) MEN1KMT2AL3MBTL1MAOBMAOA
SCHEMBL13680425 0.79 EGFR (0.75) MEN1KMT2AL3MBTL1ATMKDM4E
SCHEMBL29884104 0.77 MEN1 (0.63) MEN1KMT2AL3MBTL1MAOBMAOA
SCHEMBL13680429 0.76 EGFR (0.71) MEN1KMT2AL3MBTL1MAOBMAOA
SCHEMBL12914348 0.76 EGFR (0.52) MEN1KMT2AL3MBTL1ATMHSP90AA1
SCHEMBL22969684 0.76 MAOB (0.41) MEN1KMT2AL3MBTL1MAOBMAOA
SCHEMBL8171059 0.76 CA1 (0.73) MEN1KMT2AL3MBTL1MAOBMAOA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0451561-B1 Photopolymerisable mixture and recording material made from it MORTON INT INC (US) 1994-11-09 — — EP disclosed
US-5221595-A Printing plates, photoresist; high photosensitivity, acid resistance HOECHST AKTIENGESELLSCHAFT (DE) 1993-06-22 — — US disclosed
EP-0451561-A1 Photopolymerisable mixture and recording material made from it MORTON INTERNATIONAL, INC. (US) 1991-10-16 — — EP disclosed
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