Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 3/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | CA12 | O43570 | 1/20 | 0.32 |
| ▸ | CA1 | P00915 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | CA9 | Q16790 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | EGFR | P00533 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18426206 | 0.96 | MAPT (0.37) | MAPTSMN1; SMN2KDM4EALOX15MAPK1 | |
| SCHEMBL973714 | 0.96 | MAPT (0.37) | MAPTSMN1; SMN2KDM4EALOX15MAPK1 | |
| SCHEMBL14739930 | 0.96 | MAPT (0.37) | MAPTSMN1; SMN2KDM4EALOX15MAPK1 | |
| SCHEMBL14739368 | 0.96 | MAPT (0.37) | MAPTSMN1; SMN2KDM4EALOX15MAPK1 | |
| SCHEMBL14739314 | 0.96 | MAPT (0.37) | MAPTSMN1; SMN2KDM4EALOX15MAPK1 | |
| SCHEMBL30799718 | 0.96 | MAPT (0.37) | MAPTSMN1; SMN2KDM4EALOX15MAPK1 | |
| SCHEMBL14739158 | 0.96 | MAPT (0.37) | MAPTSMN1; SMN2KDM4EALOX15MAPK1 | |
| SCHEMBL14738958 | 0.96 | MAPT (0.37) | MAPTSMN1; SMN2KDM4EALOX15MAPK1 | |
| SCHEMBL14739160 | 0.96 | MAPT (0.37) | MAPTSMN1; SMN2KDM4EALOX15MAPK1 | |
| SCHEMBL8219045 | 0.93 | TSHR (0.37) | MAPTSMN1; SMN2KDM4EALOX15MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4572882-A1 | PROCESS FOR PRODUCING MICROPARTICLES | BASF SE (DE) | 2025-06-25 | — | — | EP | disclosed |
| US-11913131-B2 | Ternary zinc-nickel-iron alloys and alkaline electrolytes or plating such alloys | MACDERMID, INCORPORATED (US) | 2024-02-27 | — | — | US | disclosed |
| WO-2024038046-A1 | PROCESS FOR PRODUCING MICROPARTICLES | BASF SE (DE) | 2024-02-22 | — | — | WO | disclosed |
| US-20200071843-A1 | TERNARY ZINC-NICKEL-IRON ALLOYS AND ALKALINE ELECTROLYTES OR PLATING SUCH ALLOYS | MACDERMID, INCORPORATED | 2020-03-05 | — | — | US | disclosed |
| EP-3464684-A1 | TERNARY ZINC-NICKEL-IRON ALLOYS AND ALKALINE ELECTROLYTES FOR PLATING SUCH ALLOYS | Coventya Inc. (US) | 2019-04-10 | — | — | EP | disclosed |
| US-10087279-B2 | Polyol Composition | NIPPON SODA CO., LTD. (JP) | 2018-10-02 | — | — | US | disclosed |
| EP-1718786-B1 | BATHS, SYSTEMS AND PROCESSES FOR ELECTROPLATING ZINC-NICKEL TERNARY AND HIGHER ALLOYS AND ARTICLES SO ELECTROPLATED | ATOTECH DEUTSCHLAND GMBH (DE) | 2016-11-30 | — | — | EP | disclosed |
| US-20160264713-A1 | POLYOL COMPOSITION | NIPPON SODA CO., LTD. (JP) | 2016-09-15 | — | — | US | disclosed |
| EP-3061781-A1 | POLYOL COMPOSITION | Nippon Soda Co., Ltd. (JP) | 2016-08-31 | — | — | EP | disclosed |
| US-8481652-B2 | Thermoplastic polyamides having polyether amines | BASF SE (DE) | 2013-07-09 | — | — | US | disclosed |
| US-20060201820-A1 | Aqueous zinc-nickel electroplating alkaline bath, comprising water zinc compound, nickel compound, complexing agent and polyoxyalkylene nonionic surfactant; alloying; smoothness, ductility | OPASKAR VINCENT C | 2006-09-14 | — | — | US | disclosed |
| EP-1201789-B1 | Plating bath and method for electroplating tin-zinc alloys | ATOTECH DEUTSCHLAND GMBH (DE) | 2006-06-07 | — | — | EP | disclosed |
| WO-2005093133-A1 | BATHS, SYSTEMS AND PROCESSES FOR ELECTROPLATING ZINC-NICKEL TERNARY AND HIGHER ALLOYS AND ARTICLES SO ELECTROPLATED | ATOTECH DEUTSCHLAND GMBH (DE) | 2005-10-06 | — | — | WO | disclosed |
| US-20050189231-A1 | Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys | ATOTECH USA, LLC | 2005-09-01 | — | — | US | disclosed |
| US-20050133376-A1 | Alkaline zinc-nickel alloy plating compositions, processes and articles therefrom | ATOTECH USA, LLC | 2005-06-23 | — | — | US | disclosed |
| US-6436269-B1 | COMPRISING SOLUBLE METAL COMPOUNDS AND A CATIONIC POLYMER USED FOR ELECTRODEPOSITION OF METALS HAVING BRIGHT, UNIFORM COATINGS AND A WIDE CURRENT DENSITY RANGE; SOLDERS | ATOTECH DEUTSCHLAND GMBH (DE) | 2002-08-20 | — | — | US | disclosed |
| EP-1201789-A2 | Plating bath and method for electroplating tin-zinc alloys | ATOTECH Deutschland GmbH (DE) | 2002-05-02 | — | — | EP | disclosed |
| EP-0649918-B1 | Alkaline zinc-nickel alloy plating baths | ROHCO INC MCGEAN (US) | 1996-11-20 | — | — | EP | disclosed |
| US-5417840-A | Quaternary ammonium compound containing nitrogen heterocycle, brightness | MCGEAN-ROHCO, INC. (US) | 1995-05-23 | — | — | US | disclosed |
| EP-0649918-A1 | Alkaline zinc-nickel alloy plating baths | MCGEAN-ROHCO, INC. (US) | 1995-04-26 | — | — | EP | disclosed |