SCHEMBL9404041

SCHEMBL9404041

COC(=O)CCCCCCCCCCCCc1ccccc1

nearest known ligand 0.65

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.65
RXFP1 Q9HBX9 1/20 0.65
HDAC1 Q13547 4/20 0.62
ALOX5 P09917 2/20 0.62
HDAC2 Q92769 2/20 0.62
CES1 P23141 6/20 0.57
CA12 O43570 1/20 0.56
CA7 P43166 1/20 0.56
CA9 Q16790 1/20 0.56
CA14 Q9ULX7 1/20 0.56
FAAH O00519 4/20 0.56
KDM4A O75164 1/20 0.54
KDM5A P29375 1/20 0.54
KDM4C Q9H3R0 1/20 0.54
PHF8 Q9UPP1 1/20 0.54
KDM2A Q9Y2K7 1/20 0.54
HDAC3 O15379 1/20 0.53
MAPK1 P28482 1/20 0.53
ADRA1A P35348 1/20 0.53
HDAC4 P56524 1/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9219599 1.00 MAPT (0.65) MAPTRXFP1HDAC1ALOX5HDAC2
SCHEMBL20717644 1.00 MAPT (0.65) MAPTRXFP1HDAC1ALOX5HDAC2
SCHEMBL5966475 1.00 MAPT (0.65) MAPTRXFP1HDAC1ALOX5HDAC2
SCHEMBL29048467 1.00 MAPT (0.65) MAPTRXFP1HDAC1ALOX5HDAC2
SCHEMBL8662111 1.00 MAPT (0.65) MAPTRXFP1HDAC1ALOX5HDAC2
SCHEMBL9764517 1.00 MAPT (0.65) MAPTRXFP1HDAC1ALOX5HDAC2
SCHEMBL9404082 1.00 MAPT (0.65) MAPTRXFP1HDAC1ALOX5HDAC2
SCHEMBL117432 0.98 MAPT (0.61) MAPTRXFP1HDAC1ALOX5HDAC2
Bromide SCHEMBL28931279 0.96 MAPT (0.59) MAPTRXFP1HDAC1ALOX5HDAC2
Water SCHEMBL27364393 0.96 MAPT (0.59) MAPTRXFP1HDAC1ALOX5HDAC2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0323050-B1 Photosensitive compound WAKO PURE CHEM IND LTD (JP) 1994-11-02 EP disclosed
US-5250669-A Thermostability, photoresists WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1993-10-05 US disclosed
EP-0323050-A2 Photosensitive compound WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1989-07-05 EP disclosed