⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10456883 | 0.79 | — | — | |
| SCHEMBL2143465 | 0.79 | — | — | |
| SCHEMBL18916 | 0.79 | — | — | |
| SCHEMBL1168 | 0.79 | — | — | |
| SCHEMBL2143464 | 0.79 | — | — | |
| SCHEMBL2143459 | 0.79 | — | — | |
| SCHEMBL10489172 | 0.79 | — | — | |
| SCHEMBL53946 | 0.79 | — | — | |
| SCHEMBL6060607 | 0.79 | — | — | |
| SCHEMBL4260555 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119768742-A | Composition for forming silicon-containing resist underlayer film | 日产化学株式会社 | 2025-04-04 | — | — | CN | disclosed |
| CN-119563142-A | Composition for forming silicon-containing resist underlayer film containing multifunctional sulfonic acid | 日产化学株式会社 | 2025-03-04 | — | — | CN | disclosed |
| CN-119487453-A | Method for manufacturing laminate and method for manufacturing semiconductor element | 日产化学株式会社 | 2025-02-18 | — | — | CN | disclosed |
| CN-118843834-A | Composition for forming wafer edge protection film for semiconductor manufacturing | 日产化学株式会社 | 2024-10-25 | — | — | CN | disclosed |
| CN-118742855-A | Photocurable resin composition containing self-crosslinkable polymer | 日产化学株式会社 | 2024-10-01 | — | — | CN | disclosed |
| CN-118647935-A | Composition for forming silicon-containing resist underlayer film having unsaturated bond and ring structure | 日产化学株式会社 | 2024-09-13 | — | — | CN | disclosed |
| CN-118541645-A | Composition for forming silicon-containing resist underlayer film and silicon-containing resist underlayer film | 日产化学株式会社 | 2024-08-23 | — | — | CN | disclosed |
| CN-118235092-A | Polycyclic aromatic hydrocarbon-based photocurable resin composition | 日产化学株式会社 | 2024-06-21 | — | — | CN | disclosed |
| CN-117940849-A | Wafer edge protection film forming composition for semiconductor manufacturing | 日产化学株式会社 | 2024-04-26 | — | — | CN | disclosed |
| CN-117940850-A | Composition for forming silicon-containing resist underlayer film, laminate using same, and method for producing semiconductor element | 日产化学株式会社 | 2024-04-26 | — | — | CN | disclosed |
| CN-117396810-A | Composition for forming silicon-containing resist underlayer film | 日产化学株式会社 | 2024-01-12 | — | — | CN | disclosed |
| CN-117083570-A | Composition for forming silicon-containing resist underlayer film | 日产化学株式会社 | 2023-11-17 | — | — | CN | disclosed |
| CN-117063129-A | Composition for forming silicon-containing underlayer film for directional self-assembly | 日产化学株式会社 | 2023-11-14 | — | — | CN | disclosed |
| CN-116547781-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2023-08-04 | — | — | CN | disclosed |
| CN-116547343-A | Composition for forming silicon-containing resist underlayer film | 日产化学株式会社 | 2023-08-04 | — | — | CN | disclosed |
| US-8709697-B2 | Method of manufacturing toner | RICOH COMPANY, LTD. (JP) | 2014-04-29 | — | — | US | disclosed |
| US-20110014565-A1 | METHOD OF MANUFACTURING TONER | RICOH COMPANY, LTD (JP) | 2011-01-20 | — | — | US | disclosed |
| US-4039331-A | Carrier bead coating compositions | XEROX CORPORATION (US) | 1977-08-02 | — | — | US | disclosed |
| US-3976808-A | DEVELOPMENT, ELECTROSTATIC LATENT IMAGE | XEROX CORPORATION (US) | 1976-08-24 | — | — | US | disclosed |