SCHEMBL944244

SCHEMBL944244

FC(F)(F)C(F)(F)C(F)(C(F)(F)F)C1(F)OC(F)(F)C(F)(F)C1(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1537015 0.88
SCHEMBL9129178 0.86
SCHEMBL426889 0.79
SCHEMBL7211336 0.77
SCHEMBL63047 0.77
SCHEMBL951901 0.76
SCHEMBL7043393 0.76
SCHEMBL7045774 0.76
SCHEMBL7043600 0.76
SCHEMBL10591272 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 115 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2461402-A1 Oxygen-consuming electrode and method for its production Bayer MaterialScience AG (DE) 2012-06-06 EP claimed
US-6967236-B1 Methods of processing and synthesizing electrically conductive polymers and precursors thereof to form electrically conductive polymers having high electrical conductivity INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2005-11-22 US claimed
US-20050112358-A1 Methods for deposition of sensor regions onto optical storage media substrates and resulting devices GENERAL ELECTRIC COMPANY 2005-05-26 US claimed
US-20040150827-A1 Device arrays and methods for operation in aggressive solvents and for measurements of barrier properties of plurality of coatings GENERAL ELECTRIC COMPANY 2004-08-05 US claimed
US-20020172620-A1 Systems and methods for rapid evaluation of chemical resistance of materials GENERAL ELECTRIC COMPANY 2002-11-21 US claimed
US-11851571-B2 Ink set, inkjet printing apparatus, and inkjet printing method RICOH COMPANY, LTD. (JP) 2023-12-26 US disclosed
EP-3988624-B1 INK SET, INKJET PRINTING APPARATUS, AND INKJET PRINTING METHOD RICOH CO LTD (JP) 2023-04-26 EP disclosed
EP-3988624-A1 INK SET, INKJET PRINTING APPARATUS, AND INKJET PRINTING METHOD Ricoh Company, Ltd. (JP) 2022-04-27 EP disclosed
US-20220119664-A1 INK SET, INKJET PRINTING APPARATUS, AND INKJET PRINTING METHOD RICOH COMPANY, LTD. (JP) 2022-04-21 US disclosed
EP-2762605-B1 FILM FORMATION METHOD AND FILM FORMATION APPARATUS SHINCRON CO LTD (JP) 2020-05-06 EP disclosed
EP-3385249-A1 METHOD FOR PURIFYING FLUORINATED COMPOUND AGC Inc. (JP) 2018-10-10 EP disclosed
EP-2298726-B1 FLUORINE-CONTAINING COMPOUND PURIFICATION METHOD ASAHI GLASS CO LTD (JP) 2018-08-01 EP disclosed
US-5276121-A Polymers for electronic circuits, coatings or moldings E. I. DU PONT DE NEMOURS AND COMPANY (US) 1994-01-04 US disclosed
EP-0339880-B1 Low adhesion compositions of perfluoropolyethers MINNESOTA MINING & MFG (US) 1993-12-08 EP disclosed
EP-0568869-A2 Amorphous copolymers of two fluorinated ring monomers E.I. DU PONT DE NEMOURS AND COMPANY (US) 1993-11-10 EP disclosed
EP-0568869-A2 Amorphous copolymers of two fluorinated ring monomers E.I. DU PONT DE NEMOURS AND COMPANY (US) 1993-11-10 EP disclosed
WO-1993007201-A2 FINE-CELLED PLASTIC FOAM CONTAINING HALOGENATED BLOWING AGENT MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1993-04-15 WO disclosed
EP-0528529-A2 Method for the preparation of a resin membrane Shin-Etsu Chemical Co., Ltd. (JP) 1993-02-24 EP disclosed
EP-0339880-A2 Low adhesion compositions of perfluoropolyethers MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1989-11-02 EP disclosed
US-4873140-A POLY(PERFLUOROPROPYLENEOXY)ACRYLATE OR METHACRYLATE OLIGOMERS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1989-10-10 US disclosed