Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTGS1 | P23219 | 1/20 | 0.51 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 7/20 | 0.41 |
| ▸ | NPC1 | O15118 | 6/20 | 0.41 |
| ▸ | RAB9A | P51151 | 6/20 | 0.41 |
| ▸ | MAPT | P10636 | 5/20 | 0.41 |
| ▸ | LMNA | P02545 | 3/20 | 0.41 |
| ▸ | GABRA2 | P47869 | 1/20 | 0.41 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 8/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 6/20 | 0.41 |
| ▸ | HPGD | P15428 | 4/20 | 0.41 |
| ▸ | THRB | P10828 | 1/20 | 0.41 |
| ▸ | PKM | P14618 | 3/20 | 0.40 |
| ▸ | TP53 | P04637 | 4/20 | 0.39 |
| ▸ | TSHR | P16473 | 3/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | CDK5 | Q00535 | 1/20 | 0.39 |
| ▸ | CDK5R1 | Q15078 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Biphenyl SCHEMBL8845177 | 0.90 | PTGS1 (0.47) | PTGS1PTGS2SMN1; SMN2NPC1RAB9A | |
| SCHEMBL82549 | 0.89 | PTGS1 (0.62) | PTGS1PTGS2SMN1; SMN2NPC1RAB9A | |
| SCHEMBL6261630 | 0.81 | PTGS1 (0.58) | PTGS1PTGS2SMN1; SMN2NPC1RAB9A | |
| SCHEMBL713976 | 0.78 | PTGS1 (0.54) | PTGS1PTGS2SMN1; SMN2NPC1RAB9A | |
| SCHEMBL14007394 | 0.77 | SMN1; SMN2 (0.48) | PTGS1PTGS2SMN1; SMN2NPC1RAB9A | |
| SCHEMBL28087509 | 0.75 | PTGS1 (0.46) | PTGS1PTGS2SMN1; SMN2NPC1RAB9A | |
| SCHEMBL17336780 | 0.74 | PTGS1 (0.46) | PTGS1PTGS2SMN1; SMN2NPC1RAB9A | |
| SCHEMBL30872059 | 0.74 | NPC1 (0.68) | PTGS1PTGS2SMN1; SMN2NPC1RAB9A | |
| SCHEMBL6175669 | 0.74 | PTGS1 (0.54) | PTGS1PTGS2SMN1; SMN2NPC1RAB9A | |
| SCHEMBL28111728 | 0.74 | PTGS1 (0.54) | PTGS1PTGS2SMN1; SMN2NPC1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 74 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1311458-A | Photosensitive resin composition | QIMEI IND CO LTD (CN) | 2001-09-05 | — | — | CN | claimed |
| EP-4259822-A1 | SINGLE-BUFFER COMPOSITIONS FOR NUCLEIC ACID DETECTION | Mammoth Biosciences, Inc. (US) | 2023-10-18 | — | — | EP | disclosed |
| CN-111684357-B | Colored photosensitive resin composition, color filter element manufactured by using same, and display device | 东友精细化工有限公司 | 2023-10-13 | — | — | CN | disclosed |
| CN-111491963-B | Method for producing (meth) acrylic composition, coating material containing (meth) acrylic composition, and cured body | 三菱瓦斯化学株式会社 | 2023-04-28 | — | — | CN | disclosed |
| CN-112752802-B | Acrylic coating composition containing inorganic oxide particles | 日产化学株式会社 | 2023-03-03 | — | — | CN | disclosed |
| CN-112154067-B | Antifogging laminate and method for producing antifogging laminate | 富士胶片株式会社 | 2022-09-30 | — | — | CN | disclosed |
| CN-112135846-B | Polymerizable composition, ink for inkjet, heat-resistant soluble member, three-dimensional structure, and method for producing three-dimensional structure | 捷恩智株式会社 | 2022-08-23 | — | — | CN | disclosed |
| CN-113710750-B | (meth) acrylic composition, coating material containing same, and cured product | 三菱瓦斯化学株式会社 | 2022-07-12 | — | — | CN | disclosed |
| WO-2022132833-A1 | SINGLE-BUFFER COMPOSITIONS FOR NUCLEIC ACID DETECTION | MAMMOTH BIOSCIENCES, INC. (US) | 2022-06-23 | — | — | WO | disclosed |
| CN-113710750-A | (meth) acrylic composition, coating material containing same, and cured product | 三菱瓦斯化学株式会社 | 2021-11-26 | — | — | CN | disclosed |
| CN-1126005-C | Photosensitive resin composition | QIMEI IND CO LTD (CN) | 2003-10-29 | — | — | CN | disclosed |
| US-6540127-B2 | Electrostatic methods and apparatus for mounting and demounting particles from a surface having an array of tacky and non-tacky areas | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA | 2003-04-01 | — | — | US | disclosed |
| WO-2002093255-A2 | PHOTOSENSITIVE COLORING COMPOSITON, COLOR FILTER USING THE COMPOSITON AND METHOD OF PRODUCING THE SAME | SHOWA DENKO K. K. (JP) | 2002-11-21 | — | — | WO | disclosed |
| US-6410206-B1 | MIXTURE OF (METH)ACRYLIC ACID, ACRYLATED ESTER AND EPOXYCOMPOUND | DAI NIPPON PRINTING CO., LTD. (JP) | 2002-06-25 | — | — | US | disclosed |
| WO-2002001930-A2 | ELECTROSTATIC METHODS AND APPARATUS FOR MOUNTING AND DEMOUNTING PARTICLES FROM A SURFACE HAVING AN ARRAY OF TACKY AND NON-TACKY AREAS | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 2002-01-03 | — | — | WO | disclosed |
| US-6299949-B1 | Liquid crystal display devices and processes for producing the same | DAI NIPPON PRINTING CO., LTD. (JP) | 2001-10-09 | — | — | US | disclosed |
| CN-1311458-A | Photosensitive resin composition | QIMEI IND CO LTD (CN) | 2001-09-05 | — | — | CN | disclosed |
| US-6261741-B1 | CONTAINS POLYAMIDEIMIDE RESIN, AN ORGANIC SOLVENT, ACRYLIC MONOMER OR OLIGOMER, AND PHOTOINITIATOR; MAY BE PATTERNED BY SELECTIVE ULTRAVIOLET RADIATION; USED AS PHOTO-CURING ADHESIVE OR LAYER IN HIGH-DENSITY PRINTED CIRCUIT BOARD | FUJITSU LIMITED (JP) | 2001-07-17 | — | — | US | disclosed |
| CN-1301993-A | Photosensitive resin composition | QIMEI IND CO LTD (CN) | 2001-07-04 | — | — | CN | disclosed |
| US-6060215-A | FOR PRODUCING A FLEXIBLE PRINTED CIRCUIT BOARD | HITACHI, LTD. (JP) | 2000-05-09 | — | — | US | disclosed |