⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15402359 | 0.74 | — | — | |
| SCHEMBL15404437 | 0.72 | — | — | |
| SCHEMBL727746 | 0.72 | — | — | |
| SCHEMBL727747 | 0.72 | — | — | |
| SCHEMBL15402998 | 0.67 | — | — | |
| SCHEMBL17387948 | 0.67 | — | — | |
| SCHEMBL15403072 | 0.67 | — | — | |
| SCHEMBL721548 | 0.67 | — | — | |
| SCHEMBL1471362 | 0.67 | — | — | |
| SCHEMBL1240685 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 138 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2013075293-A1 | PROCESS FOR EMULSION POLYMERIZING HYDROPHOBIC MONOMERS | EVONIK INDUSTRIES AG (DE) | 2013-05-30 | — | — | WO | claimed |
| US-5492792-A | OPTICAL CARD OR DISKS; EXCELLENT LIGHT SENSITIVITY WITHIN NEAR INFRARED REGION AND HEAT RESISTANCE; STORE INFORMATIONSAT HIGH DENSITY | CANON KABUSHIKI KAISHA (JP) | 1996-02-20 | — | — | US | claimed |
| US-20240172550-A1 | CHARGE-TRANSPORTING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2024-05-23 | — | — | US | disclosed |
| WO-2024090362-A1 | CHARGE-TRANSPORTING COMPOSITION | 日産化学株式会社 | 2024-05-02 | — | — | WO | disclosed |
| WO-2024071060-A1 | CHARGE-TRANSPORTING COMPOSITION | 日産化学株式会社 | 2024-04-04 | — | — | WO | disclosed |
| WO-2023189399-A1 | POLYMER AND USE THEREOF | 日産化学株式会社 | 2023-10-05 | — | — | WO | disclosed |
| WO-2023080024-A1 | CHARGE-TRANSPORTING COMPOSITION | 日産化学株式会社 | 2023-05-11 | — | — | WO | disclosed |
| WO-2023008176-A1 | FLUORINATED ARYLSULFONATE POLYMER COMPOUND AND USE THEREOF | 日産化学株式会社 | 2023-02-02 | — | — | WO | disclosed |
| US-20220093865-A1 | CHARGE-TRANSPORTING COMPOSITION FOR PEROVSKITE PHOTOELECTRIC CONVERSION ELEMENT | NISSAN CHEMICAL CORPORATION (JP) | 2022-03-24 | — | — | US | disclosed |
| CN-109415309-B | Sulfonate compound and use thereof | 日产化学株式会社 | 2022-02-25 | — | — | CN | disclosed |
| EP-3916821-A1 | CHARGE-TRANSPORTING COMPOSITION FOR PEROVSKITE PHOTOELECTRIC CONVERSION ELEMENT | Nissan Chemical Corporation (JP) | 2021-12-01 | — | — | EP | disclosed |
| WO-2004032928-A1 | 5-SUBSTITUTED 2H-PYRAZONE-3-CARBOXYLIC ACID DERIVATIVES AS ANTILIPOLYTIC AGENTS FOR THE TREATMENT OF METABOLIC-RELATED DISORDERS SUCH AS DYSLIPIDEMIA | ARENA PHARMACEUTICALS, INC. (US) | 2004-04-22 | — | — | WO | disclosed |
| US-6210603-B1 | HIGH VOLTAGE HOLDING RATIO, ALTERED ONLY SLIGHTLY BY CHANGE OF TEMPERATURE, AND LOW THRESHOLD VOLTAGE | CHISSO CORPORATION (JP) | 2001-04-03 | — | — | US | disclosed |
| EP-0949231-A1 | FLUORINE-SUBSTITUTED BENZENE DERIVATIVES, LIQUID-CRYSTAL COMPOSITION, AND LIQUID-CRYSTAL DISPLAY ELEMENT | CHISSO CORPORATION (JP) | 1999-10-13 | — | — | EP | disclosed |
| EP-0468531-B2 | 2-Diazo-1,2-quinone compounds and image forming materials prepared using the compounds | FUJI PHOTO FILM CO LTD (JP) | 1997-11-12 | — | — | EP | disclosed |
| US-5514518-A | CHANGE IN POLARITY UPON EXPOSURE REDUCES ADHESIVENESS | FUJI PHOTO FILM CO., LTD. (JP) | 1996-05-07 | — | — | US | disclosed |
| US-5492792-A | OPTICAL CARD OR DISKS; EXCELLENT LIGHT SENSITIVITY WITHIN NEAR INFRARED REGION AND HEAT RESISTANCE; STORE INFORMATIONSAT HIGH DENSITY | CANON KABUSHIKI KAISHA (JP) | 1996-02-20 | — | — | US | disclosed |
| US-5482822-A | MULTILAYER ELEMENT FOR OPTICAL DISKS WITH SUBSTRATE AND OPTICAL COATINGS | CANON KABUSHIKI KAISHA (JP) | 1996-01-09 | — | — | US | disclosed |
| US-5384227-A | Optical recording material with supports and light sensitive layers, for receiver sheets, photoresists and printing plates | FUJI PHOTO FILM CO., LTD. (JP) | 1995-01-24 | — | — | US | disclosed |
| US-5312905-A | Image forming materials | FUJI PHOTO FILM CO., LTD. (JP) | 1994-05-17 | — | — | US | disclosed |