⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Charcoal, Activated SCHEMBL31506598 | 1.00 | — | — | |
| Charcoal, Activated SCHEMBL4021080 | 1.00 | — | — | |
| Charcoal, Activated SCHEMBL135385 | 1.00 | — | — | |
| Charcoal, Activated SCHEMBL2822959 | 0.87 | — | — | |
| Charcoal, Activated SCHEMBL9466404 | 0.87 | — | — | |
| Charcoal, Activated SCHEMBL9466402 | 0.87 | — | — | |
| Charcoal, Activated SCHEMBL2822964 | 0.87 | — | — | |
| Charcoal, Activated SCHEMBL8975650 | 0.87 | — | — | |
| Charcoal, Activated SCHEMBL8975658 | 0.87 | — | — | |
| Fluoride SCHEMBL8152871 | 0.87 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115148643-B | Wet etching apparatus and wet etching method | 中国科学院上海微系统与信息技术研究所 | 2025-05-13 | — | — | CN | disclosed |
| EP-2764908-A1 | GAS SEPARATION MEMBRANE, METHOD OF PRODUCING THE SAME, AND GAS SEPARATION MEMBRANE MODULE USING THE SAME | Fujifilm Corporation (JP) | 2014-08-13 | — | — | EP | disclosed |
| US-20140208949-A1 | GAS SEPARATION MEMBRANE, METHOD OF PRODUCING THE SAME, AND GAS SEPARATING MEMBRANE MODULE USING THE SAME | FUJIFILM CORPORATION (JP) | 2014-07-31 | — | — | US | disclosed |
| US-8557748-B2 | Method for immobilization, physiologically active substance-immobilized carrier, carrier for immobilization, carrier, and process for producing carrier | FUJIFILM CORPORATION (JP) | 2013-10-15 | — | — | US | disclosed |
| US-20130150562-A1 | METHOD FOR IMMOBILIZATION, PHYSIOLOGICALLY ACTIVE SUBSTANCE-IMMOBILIZED CARRIER, CARRIER FOR IMMOBILIZATION, CARRIER, AND PROCESS FOR PRODUCING CARRIER | FUJIFILM CORPORATION (JP) | 2013-06-13 | — | — | US | disclosed |
| US-8404621-B2 | Method for immobilization, physiologically active substance-immobilized carrier, carrier for immobilization, carrier, and process for producing carrier | FUJIFILM CORPORATION (JP) | 2013-03-26 | — | — | US | disclosed |
| CN-101611043-B | Material for forming silicon-containing film, and silicon-containing insulating film and method for forming the same | JSR CORP | 2013-03-13 | — | — | CN | disclosed |
| US-8236575-B2 | Carrier for analysis of an analyte and process for producing the same | FUJIFILM CORPORATION (JP) | 2012-08-07 | — | — | US | disclosed |
| US-20110129942-A1 | FLUORESCENCE DETECTING METHOD | FUJIFILM CORPORATION (JP) | 2011-06-02 | — | — | US | disclosed |
| US-20110020649-A1 | METHOD FOR IMMOBILIZATION, PHYSIOLOGICALLY ACTIVE SUBSTANCE-IMMOBILIZED CARRIER, CARRIER FOR IMMOBILIZATION, CARRIER, AND PROCESS FOR PRODUCING CARRIER | FUJIFILM CORPORATION (JP) | 2011-01-27 | — | — | US | disclosed |
| EP-2224241-A1 | CARRIER FOR USE IN MEASUREMENT OF ANALYTE, AND METHOD FOR PRODUCTION THEREOF | FUJIFILM Corporation (JP) | 2010-09-01 | — | — | EP | disclosed |
| US-20100174103-A1 | MATERIAL FOR FORMING SILICON-CONTAINING FILM, AND SILICON-CONTAINING INSULATING FILM AND METHOD FOR FORMING THE SAME | JSR CORPORATION (JP) | 2010-07-08 | — | — | US | disclosed |
| CN-101611043-A | Containing silicon fiml forms with material and contains silicon insulating film and forming method thereof | JSR CORP (JP) | 2009-12-23 | — | — | CN | disclosed |
| EP-2123658-A1 | MATERIAL FOR FORMING SILICON-CONTAINING FILM, AND SILICON-CONTAINING INSULATING FILM AND METHOD FOR FORMING THE SAME | JSR Corporation (JP) | 2009-11-25 | — | — | EP | disclosed |
| US-20090081371-A1 | SUBSTRATE AND METHOD FOR PRODUCING THE SUBSTRATE | FUJIFILM CORPORATION (JP) | 2009-03-26 | — | — | US | disclosed |
| US-20030042140-A1 | Chemical furface for control of electroosmosis by an applied external voltage field | ARIZONA BOARD OF REGENTS | 2003-03-06 | — | — | US | disclosed |
| US-6488831-B1 | Chemical surface for control of electroosmosis by an applied external voltage field | ARIZONA BOARD OF REGENTS ARIZONA STATE UNIVERSITY | 2002-12-03 | — | — | US | disclosed |
| EP-1060389-A1 | CHEMICAL SURFACE FOR CONTROL OF ELECTROOSMOSIS BY AN APPLIED EXTERNAL VOLTAGE FIELD | Arizona Board of Regents (US) | 2000-12-20 | — | — | EP | disclosed |
| WO-1999045377-A1 | CHEMICAL SURFACE FOR CONTROL OF ELECTROOSMOSIS BY AN APPLIED EXTERNAL VOLTAGE FIELD | ARIZONA BOARD OF REGENTS (US) | 1999-09-10 | — | — | WO | disclosed |
| US-3998991-A | Transparent abrasion-resistant coating for a styrene acrylonitrile copolymer and method | GENERAL MOTORS CORPORATION (US) | 1976-12-21 | — | — | US | disclosed |