Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MGAM | O43451 | 1/20 | 0.53 |
| ▸ | GAA | P10253 | 1/20 | 0.53 |
| ▸ | SI | P14410 | 1/20 | 0.53 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.50 |
| ▸ | HTT | P42858 | 2/20 | 0.47 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.45 |
| ▸ | KDM6B | O15054 | 1/20 | 0.45 |
| ▸ | KDM5C | P41229 | 1/20 | 0.45 |
| ▸ | EGLN1 | Q9GZT9 | 1/20 | 0.45 |
| ▸ | PHF8 | Q9UPP1 | 1/20 | 0.45 |
| ▸ | KDM2A | Q9Y2K7 | 1/20 | 0.45 |
| ▸ | LMNA | P02545 | 4/20 | 0.42 |
| ▸ | CA2 | P00918 | 1/20 | 0.40 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.40 |
| ▸ | MMP12 | P39900 | 1/20 | 0.40 |
| ▸ | SLC15A2 | Q16348 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1608 | 0.95 | — | — | |
| SCHEMBL10389469 | 0.95 | MGAM (0.56) | MGAMGAASIMGAM2ALDH1A1 | |
| SCHEMBL2128645 | 0.95 | MGAM (0.56) | MGAMGAASIMGAM2ALDH1A1 | |
| SCHEMBL68631 | 0.91 | — | — | |
| SCHEMBL22325638 | 0.91 | — | — | |
| Water SCHEMBL23151837 | 0.91 | MGAM (0.53) | MGAMGAASIMGAM2ALDH1A1 | |
| SCHEMBL21404935 | 0.91 | — | — | |
| SCHEMBL21404928 | 0.91 | — | — | |
| SCHEMBL9579652 | 0.91 | MGAM (0.53) | MGAMGAASIMGAM2ALDH1A1 | |
| SCHEMBL11219945 | 0.91 | MGAM (0.53) | MGAMGAASIMGAM2ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104685021-B | The improved stability of polyurethane polyol blend comprising halogenated olefin blowing agents | 阿科玛股份有限公司 | 2018-04-13 | — | — | CN | claimed |
| CN-104685021-A | Improved stability of polyurethane polyol blends containing halogenated olefin blowing agent | ARKEMA INC | 2015-06-03 | — | — | CN | claimed |
| EP-3550595-B1 | COATING LIQUID FOR FORMING OXIDE OR OXYNITRIDE INSULATOR FILM AND A METHOD FOR MANUFACTURING USING THE COATING LIQUID | RICOH CO LTD (JP) | 2024-04-10 | — | — | EP | disclosed |
| CN-113692430-A | Primer composition | 思美定株式会社 | 2021-11-23 | — | — | CN | disclosed |
| CN-113396195-A | Primer composition | 思美定株式会社 | 2021-09-14 | — | — | CN | disclosed |
| US-11049951-B2 | Coating liquid for forming oxide or oxynitride insulator film, oxide or oxynitride insulator film, field-effect transistor, and method for producing the same | RICOH COMPANY, LTD. (JP) | 2021-06-29 | — | — | US | disclosed |
| EP-3550595-A1 | COATING LIQUID FOR FORMING OXIDE OR OXYNITRIDE INSULATOR FILM, OXIDE OR OXYNITRIDE INSULATOR FILM, FIELD EFFECT TRANSISTOR, AND METHODS FOR MANUFACTURING THESE | Ricoh Company, Ltd. (JP) | 2019-10-09 | — | — | EP | disclosed |
| US-20190280098-A1 | COATING LIQUID FOR FORMING OXIDE OR OXYNITRIDE INSULATOR FILM, OXIDE OR OXYNITRIDE INSULATOR FILM, FIELD-EFFECT TRANSISTOR, AND METHOD FOR PRODUCING THE SAME | RICOH COMPANY, LTD. (JP) | 2019-09-12 | — | — | US | disclosed |
| CN-104685021-B | The improved stability of polyurethane polyol blend comprising halogenated olefin blowing agents | 阿科玛股份有限公司 | 2018-04-13 | — | — | CN | disclosed |
| CN-104685021-A | Improved stability of polyurethane polyol blends containing halogenated olefin blowing agent | ARKEMA INC | 2015-06-03 | — | — | CN | disclosed |
| EP-0408753-B1 | PROCESS FOR FORMING SUPERCONDUCTING THIN FILM | Oki Electric Industry Company, Limited (JP) | 1993-06-16 | — | — | EP | disclosed |
| US-5116811-A | CVD METHOD FOR THE FORMATION OF BI-CONTAINING SUPERCONDUCTING THIN FILMS | OKI ELECTRIC INDUSTRY CO., LTD. (JP) | 1992-05-26 | — | — | US | disclosed |
| EP-0408753-A1 | PROCESS FOR FORMING SUPERCONDUCTING THIN FILM | Oki Electric Industry Company, Limited (JP) | 1991-01-23 | — | — | EP | disclosed |