SCHEMBL9505962

SCHEMBL9505962

B.CN(C)N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11418176 1.00
Hydrazine SCHEMBL11600083 0.94
SCHEMBL48575 0.93
SCHEMBL1682929 0.93
SCHEMBL28081962 0.93
Hydrochloric Acid SCHEMBL2225918 0.86
Hydrochloric Acid SCHEMBL1913494 0.86
SCHEMBL6435437 0.86
Ethane SCHEMBL10431270 0.86
Hydrazine SCHEMBL3175586 0.86

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113546660-B Alloy catalyst and application thereof in efficient hydrogen production of borane derivatives 南京理工大学 2023-10-13 CN claimed
CN-113546660-A Alloy catalyst and application thereof in efficient hydrogen production of borane derivative 南京理工大学 2021-10-26 CN claimed
CN-113546660-B Alloy catalyst and application thereof in efficient hydrogen production of borane derivatives 南京理工大学 2023-10-13 CN disclosed
CN-113546660-B Alloy catalyst and application thereof in efficient hydrogen production of borane derivatives 南京理工大学 2023-10-13 CN disclosed
CN-113546660-A Alloy catalyst and application thereof in efficient hydrogen production of borane derivative 南京理工大学 2021-10-26 CN disclosed
EP-0384180-B1 FORMALDEHYDE-FREE ELECTROLESS COPPER PLATING SOLUTIONS LeaRonal, Inc. (US) 1993-08-11 EP disclosed
EP-0384180-A1 Formaldehyde-free electroless copper plating solutions LeaRonal, Inc. (US) 1990-08-29 EP disclosed