SCHEMBL9507133

SCHEMBL9507133

C=C(CC=C(C)C(=O)O)C(=O)OC.C=CC(=O)OCC(CC)CCCC

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.62
TDP1 Q9NUW8 2/20 0.40
CYP3A4 P08684 4/20 0.40
ATM Q13315 1/20 0.40
ALDH1A1 P00352 5/20 0.36
CA2 P00918 2/20 0.36
HPGD P15428 1/20 0.35
RECQL P46063 1/20 0.35
LMNA P02545 3/20 0.35
MAPK1 P28482 3/20 0.35
HSD17B10 Q99714 1/20 0.33
PRSS1 P07477 1/20 0.33
PRSS2 P07478 1/20 0.33
PRSS3 P35030 1/20 0.33
CA1 P00915 1/20 0.32
MMP9 P14780 1/20 0.32
MMP8 P22894 1/20 0.32
MMP14 P50281 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
ZDHHC7 Q9NXF8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8776473 0.89 TSHR (0.45) TSHRTDP1CYP3A4ATMALDH1A1
SCHEMBL15529137 0.88 TSHR (0.47) TSHRTDP1CYP3A4ATMALDH1A1
SCHEMBL10830912 0.87 TSHR (0.48) TSHRTDP1CYP3A4ATMALDH1A1
SCHEMBL7996150 0.86 TSHR (0.51) TSHRTDP1CYP3A4ATMALDH1A1
Methacrylic Acid SCHEMBL8956686 0.84 TSHR (0.71) TSHRTDP1CYP3A4ATMALDH1A1
SCHEMBL2462155 0.84 TSHR (0.63) TSHRTDP1CYP3A4ATMALDH1A1
SCHEMBL2878453 0.83 TSHR (0.55) TSHRCYP3A4ATMALDH1A1HPGD
SCHEMBL5361438 0.83 TSHR (0.55) TSHRCYP3A4ATMALDH1A1HPGD
SCHEMBL1931959 0.83 TSHR (0.76) TSHRTDP1CYP3A4ATMALDH1A1
SCHEMBL29141898 0.83 TSHR (0.76) TSHRTDP1CYP3A4ATMALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107111235-B Protective film for dry film resist and photosensitive resin laminate 三菱化学株式会社 2020-11-10 CN disclosed
EP-0243177-B1 CATALYTIC PRODUCTION OF POLYAMIDE BLOCK COPOLYMERS SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1993-07-07 EP disclosed
EP-0305545-B1 SUBSTITUTED ACRIDINE DERIVATIVES AND THEIR USE Hitachi Chemical Co., Ltd. (JP) 1993-02-10 EP disclosed
US-5089377-A Acridin-9-yl acrylates ASAHI DENKA KOGYO K.K. (JP) 1992-02-18 US disclosed
US-5045433-A Photopolymerization initiators HITACHI CHEMICAL CO., LTD. (JP) 1991-09-03 US disclosed
US-4985564-A Acridine compound and photopolymerizable composition using the same HITACHI CHEMICAL CO., LTD. (JP) 1991-01-15 US disclosed
US-4925768-A METHYL METHACRYLATE, ETHYLHEXYL ACRYLATE, METHACRYLIC ACID, AND BENZYL (METH)ACRYLATE FUJI PHOTO FILM CO., LTD. (JP) 1990-05-15 US disclosed
EP-0360443-A1 Acridine compound and photopolymerizable composition using the same Hitachi Chemical Co., Ltd. (JP) 1990-03-28 EP disclosed
EP-0305545-A1 SUBSTITUTED ACRIDINE DERIVATIVES AND THEIR USE Hitachi Chemical Co., Ltd. (JP) 1989-03-08 EP disclosed
US-4775721-A Process for producing polyamide block copolymer SUMIMOTO CHEMICAL COMPANY, LIMITED (JP) 1988-10-04 US disclosed