SCHEMBL954060

SCHEMBL954060

FC(F)=C(F)OC(F)(F)C(F)(F)OC(F)=C(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10036814 0.91
SCHEMBL4443070 0.87
SCHEMBL39087 0.87
SCHEMBL10036810 0.87
SCHEMBL1200466 0.86
SCHEMBL10014256 0.84
SCHEMBL10036822 0.84
SCHEMBL10036811 0.84
SCHEMBL10036823 0.84
SCHEMBL10036812 0.84

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 124 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11876179-B2 Silicon-based energy storage devices with electrolyte containing dimethoxyethane based compound ENEVATE CORPORATION (US) 2024-01-16 US claimed
US-20220282099-A1 ADHERENT AMORPHOUS PERFLUOROPOLMER COMPOSITION JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT 2022-09-08 US claimed
EP-4013830-A1 ADHERENT AMORPHOUS PERFLUOROPOLYMER COMPOSITION The Chemours Company FC, LLC (US) 2022-06-22 EP claimed
CN-114555728-A Adherent amorphous perfluoropolymer compositions 科慕埃弗西有限公司 2022-05-27 CN claimed
US-11261280-B2 Fluorinated block copolymers 3M INNOVATIVE PROPERTIES COMPANY (US) 2022-03-01 US claimed
EP-2927251-A1 METHOD FOR PRODUCING FLUORINE-CONTAINING ELASTOMER Unimatec Co., Ltd. (JP) 2015-10-07 EP claimed
EP-2698390-A1 METHOD FOR PRODUCING FLUORINE-CONTAINING ELASTOMER Unimatec Co., Ltd. (JP) 2014-02-19 EP claimed
US-20140039130-A1 METHOD FOR PRODUCING FLUORINE-CONTAINING ELASTOMER UNIMATEC CO., LTD. (JP) 2014-02-06 US claimed
EP-4748863-A1 METHOD FOR PRODUCING FLUOROELASTOMER, AQUEOUS DISPERSION, AND SOLID COMPOSITION AGC Inc. (JP) 2026-05-27 EP disclosed
WO-2026105370-A1 SHEET, METHOD FOR PRODUCING SHEET, AND CROSSLINKED RUBBER ARTICLE AGC株式会社 2026-05-21 WO disclosed
WO-2026105786-A1 FLUORINE-CONTAINING CROSSLINKED BODY AND METHOD FOR PRODUCING SAME, AND LAMINATE AND METHOD FOR MANUFACTURING SAME AGC株式会社 2026-05-21 WO disclosed
US-20260132231-A1 METHOD FOR PRODUCING FLUORINATED ELASTOMER, AQUEOUS DISPERSION, AND SOLID COMPOSITION AGC Inc. (JP) 2026-05-14 US disclosed
EP-3636682-B1 FLUORINE-CONTAINING ELASTIC COPOLYMER AND PRODUCTION METHOD THEREFOR AGC INC (JP) 2026-05-06 EP disclosed
WO-2026088776-A1 COMPOSITION AND CROSSLINKED PRODUCT AGC株式会社 2026-04-30 WO disclosed
US-8119765-B2 curable fluoropolymers used as thin films having heat resistance, chemical resistance, low refractive index, low dielectric property, lubricity, water- and oil-repellency FUJIFILM CORPORATION (JP) 2012-02-21 US disclosed
US-8119765-B2 curable fluoropolymers used as thin films having heat resistance, chemical resistance, low refractive index, low dielectric property, lubricity, water- and oil-repellency FUJIFILM CORPORATION (JP) 2012-02-21 US disclosed
US-20110008710-A1 MATERIAL FOR CATALYST LAYER FOR POLYMER ELECTROLYTE FUEL CELL ASAHI GLASS COMPANY, LIMITED (JP) 2011-01-13 US disclosed
US-20080274334-A1 Dry Etching Gas and Method of Dry Etching NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2008-11-06 US disclosed
US-20080255337-A1 NOVEL CROSSLINKABLE FLUORINE-CONTAINING ETHER COMPOUND FUJIFILM CORPORATION (JP) 2008-10-16 US disclosed
EP-1760769-A1 DRY ETCHING GASES AND METHOD OF DRY ETCHING National Institute of Advanced Industrial Science and Technology (JP) 2007-03-07 EP disclosed