Cyclohexanone

Cyclohexanone

SCHEMBL9561320

O=C1CCCCC1.O=C1CCCO1

nearest known ligand 0.71

Full drug profile on Sugi Atlas →

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.71
CA9 Q16790 1/20 0.71
TRIM24 O15164 2/20 0.55
TRIM33 Q9UPN9 2/20 0.55
ALDH1A1 P00352 2/20 0.55
LMNA P02545 1/20 0.48
TP53 P04637 1/20 0.48
TSHR P16473 1/20 0.48
FKBP4 Q02790 3/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2348331 1.00 CA1 (0.71) CA1CA9TRIM24TRIM33ALDH1A1
SCHEMBL2562226 1.00 CA1 (0.71) CA1CA9TRIM24TRIM33ALDH1A1
SCHEMBL6201351 0.98 CA1 (0.68) CA1CA9TRIM24TRIM33ALDH1A1
SCHEMBL3324936 0.97 CA1 (0.75) CA1CA9TRIM24TRIM33ALDH1A1
Cyclopentanone SCHEMBL3628580 0.97 CA1 (0.75) CA1CA9TRIM24TRIM33ALDH1A1
SCHEMBL13317121 0.95 CA1 (0.80) CA1CA9TRIM24TRIM33ALDH1A1
SCHEMBL15141411 0.95 CA1 (0.80) CA1CA9TRIM24TRIM33ALDH1A1
SCHEMBL17515063 0.95 CA1 (0.80) CA1CA9TRIM24TRIM33ALDH1A1
Cyclohexanone SCHEMBL2324675 0.95 CA1 (0.80) CA1CA9TRIM24TRIM33ALDH1A1
SCHEMBL5243566 0.95 CA1 (0.80) CA1CA9TRIM24TRIM33ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210061664-A1 APPLICATIONS OF ENGINEERED GRAPHENE ALPHA ASSEMBLY SOLUTIONS INC. 2021-03-04 US disclosed
EP-3775318-A1 APPLICATIONS OF ENGINEERED GRAPHENE Alpha Assembly Solutions Inc. (US) 2021-02-17 EP disclosed
CN-112004962-A Application of engineered graphene 阿尔法装配解决方案公司 2020-11-27 CN disclosed
US-10303058-B2 Pattern forming method, treating agent, electronic device, and method for manufacturing the same FUJIFILM CORPORATION (JP) 2019-05-28 US disclosed
US-9810981-B2 Pattern formation method, etching method, electronic device manufacturing method, and electronic device FUJIFILM CORPORATION (JP) 2017-11-07 US disclosed
US-20160342083-A1 PATTERN FORMATION METHOD, ETCHING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2016-11-24 US disclosed
US-20160327866-A1 PATTERN FORMING METHOD, TREATING AGENT, ELECTRONIC DEVICE, AND METHOD FOR MANUFACTURING THE SAME FUJIFILM CORPORATION (JP) 2016-11-10 US disclosed
CN-103814470-B Redox flow batteries group system 新加坡国立大学 2016-11-09 CN disclosed
US-5259992-A Cuprous iodide-pyridine derivative complex REXHAM GRAPHICS INC. (US) 1993-11-09 US disclosed
US-4264477-A ELECTROCONDUCTIVE CARBON BLACK AND METAL PARTICLES HELD TOGETHER BY A POLYMERIC BINDER CHOMERICS, INC. (US) 1981-04-28 US disclosed