⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11582574 | 1.00 | — | — | |
| SCHEMBL7945537 | 1.00 | — | — | |
| SCHEMBL336269 | 1.00 | — | — | |
| SCHEMBL7938439 | 0.82 | — | — | |
| SCHEMBL5886595 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL11601435 | 0.82 | — | — | |
| Fluoride SCHEMBL8921939 | 0.82 | — | — | |
| SCHEMBL716968 | 0.82 | — | — | |
| Charcoal, Activated SCHEMBL716063 | 0.82 | — | — | |
| SCHEMBL2228792 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0561132-A1 | Refractory metal capped low resistivity metal conductor lines and vias formed using PVD and CVD | International Business Machines Corporation (US) | 1993-09-22 | — | — | EP | claimed |
| CN-1076548-A | Refractory metal capped low resistance metal conductor lines and vias formed by PVD and CVD | IBM (US) | 1993-09-22 | — | — | CN | claimed |
| CN-108569841-B | Alloy cutter shaft with coating | 北京沃尔德金刚石工具股份有限公司 | 2023-07-21 | — | — | CN | disclosed |