SCHEMBL956522

SCHEMBL956522

CCC(C)C(O)CCCCCCO

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TRPV1 Q8NER1 1/20 0.44
TRPA1 O75762 1/20 0.44
SPHK1 Q9NYA1 2/20 0.43
PTPN1 P18031 1/20 0.42
LMNA P02545 5/20 0.41
CYP2D6 P10635 2/20 0.41
GMNN O75496 1/20 0.41
POLB P06746 1/20 0.41
THPO P40225 1/20 0.41
MTOR P42345 1/20 0.41
BLM P54132 1/20 0.41
KDM4E B2RXH2 1/20 0.41
TP53 P04637 1/20 0.41
CYP1A2 P05177 1/20 0.41
CYP3A4 P08684 1/20 0.41
MAPT P10636 1/20 0.41
CETP P11597 1/20 0.41
HTT P42858 1/20 0.41
UBE2N P61088 1/20 0.41
TSHR P16473 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28174491 1.00 TRPV1 (0.44) TRPV1TRPA1SPHK1PTPN1LMNA
SCHEMBL10429765 1.00 TRPV1 (0.44) TRPV1TRPA1SPHK1PTPN1LMNA
SCHEMBL5907121 0.91 PTPN1 (0.41) TRPV1TRPA1SPHK1PTPN1LMNA
SCHEMBL30987409 0.91 TRPV1 (0.52) TRPV1TRPA1SPHK1PTPN1LMNA
SCHEMBL8412963 0.90 PTPN1 (0.39) TRPV1TRPA1SPHK1PTPN1LMNA
SCHEMBL6443782 0.84 SPHK1 (0.61) TRPV1TRPA1SPHK1PTPN1LMNA
SCHEMBL474319 0.84 SPHK1 (0.61) TRPV1TRPA1SPHK1PTPN1LMNA
SCHEMBL17929094 0.84 TRPV1 (0.46) TRPV1TRPA1SPHK1PTPN1LMNA
SCHEMBL11673194 0.84 SPHK1 (0.61) TRPV1TRPA1SPHK1PTPN1LMNA
SCHEMBL11759808 0.84 SPHK1 (0.61) TRPV1TRPA1SPHK1PTPN1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8318613-B2 Composition for manufacturing SiO2 resist layers and method of its use MERCK PATENT GMBH (DE) 2012-11-27 US claimed
EP-2291549-A2 COMPOSITION FOR MANUFACTURING SIO2 RESIST LAYERS AND METHOD OF ITS USE Merck Patent GmbH (DE) 2011-03-09 EP claimed
US-20110021037-A1 COMPOSITION FOR MANUFACTURING SIO2 RESIST LAYERS AND METHOD OF ITS USE MERCK PATENT GESELLSCHAFT (DE) 2011-01-27 US claimed
WO-2009118083-A2 COMPOSITION FOR MANUFACTURING SIO2 RESIST LAYERS AND METHOD OF ITS USE MERCK PATENT GMBH (DE) 2009-10-01 WO claimed