SCHEMBL9580702

SCHEMBL9580702

O=C1CC(=O)N(S)C(=O)N1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 13/20 0.41
KMT2A Q03164 13/20 0.41
MAPT P10636 13/20 0.39
ALDH1A1 P00352 2/20 0.38
CYP3A4 P08684 1/20 0.38
CYP2C9 P11712 1/20 0.38
PKM P14618 1/20 0.38
CYP2C19 P33261 1/20 0.38
LMNA P02545 1/20 0.36
RAB9A P51151 1/20 0.36
HSD17B10 Q99714 5/20 0.35
L3MBTL1 Q9Y468 3/20 0.35
ALOX12 P18054 2/20 0.35
POLB P06746 2/20 0.34
HBB P68871 2/20 0.34
PSMD14 O00487 1/20 0.34
MMP2 P08253 1/20 0.34
DNMT1 P26358 1/20 0.34
APEX1 P27695 1/20 0.34
PTPN7 P35236 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2239780 0.68 MEN1 (0.39) MEN1KMT2AMAPTALDH1A1CYP3A4
SCHEMBL3974099 0.68 MAPT (0.39) MEN1KMT2AMAPTALDH1A1CYP3A4
SCHEMBL1263340 0.68 CRBN (0.44) MEN1KMT2AMAPTALDH1A1CYP3A4
SCHEMBL18656903 0.68 MAPT (0.39) MEN1KMT2AMAPTALDH1A1CYP3A4
SCHEMBL11049824 0.67 MAPT (0.42) MEN1KMT2AMAPTALDH1A1CYP3A4
SCHEMBL1509853 0.65
SCHEMBL11335800 0.65 MAPT (0.37) MEN1KMT2AMAPTALDH1A1CYP3A4
SCHEMBL7619818 0.65 MAPT (0.37) MEN1KMT2AMAPTALDH1A1CYP3A4
SCHEMBL15411913 0.65 MAPT (0.37) MEN1KMT2AMAPTALDH1A1CYP3A4
SCHEMBL3060072 0.65 MAPT (0.37) MEN1KMT2AMAPTALDH1A1CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111698980-A Microcapsules having a porous or hollow core and a pH-sensitive shell and uses thereof 3M创新有限公司 2020-09-22 CN claimed
JP-58109483-A None JP disclosed
CN-111743783-B Double-paste type dental resin reinforced glass ion water-gate composition 株式会社松风 2024-04-16 CN disclosed
CN-116507309-A Dental pH sensitive microcapsules 3M创新有限公司 2023-07-28 CN disclosed
CN-111699231-B Primer initiated curing of structural adhesive films 3M创新有限公司 2023-07-28 CN disclosed
CN-111699229-B Film initiated structural adhesive film curing 3M创新有限公司 2023-02-28 CN disclosed
CN-115279853-A Primer initiated thermal debonding of curable structural adhesive films 3M创新有限公司 2022-11-01 CN disclosed
CN-115244150-A Composite PSA/structural adhesive bonds tunable by patterned surface-initiated curing 3M创新有限公司 2022-10-25 CN disclosed
CN-111699230-B Primer initiated structural adhesive film curing 3M创新有限公司 2022-08-16 CN disclosed
CN-113905812-A Microcapsules having a porous or hollow core and a shell comprising a component that releases a gas upon contact with an acid 3M创新有限公司 2022-01-07 CN disclosed
CN-111699231-A Primer initiated structural adhesive film curing 3M创新有限公司 2020-09-22 CN disclosed
CN-111699229-A Film initiated structural adhesive film curing 3M创新有限公司 2020-09-22 CN disclosed
CN-111698980-A Microcapsules having a porous or hollow core and a pH-sensitive shell and uses thereof 3M创新有限公司 2020-09-22 CN disclosed
CN-111699230-A Primer initiated structural adhesive film curing 3M创新有限公司 2020-09-22 CN disclosed
CN-102250019-B (Thio) barbituric acid compound and application thereof UNIV SICHUAN 2013-06-26 CN disclosed
CN-102250019-A (Thio) barbituric acid compound and application thereof UNIV SICHUAN 2011-11-23 CN disclosed
US-5252629-A Adhesives for dentin GC CORPORATION (JP) 1993-10-12 US disclosed
EP-0480785-A2 Polymerization initiator composition controlling polymerization at interface and curable composition containing same TERUMO KABUSHIKI KAISHA (JP) 1992-04-15 EP disclosed
US-4395473-A Electrophotographic sensitive materials containing barbituric acid or thiobarbituric acid derivaties FUJI PHOTO FILM CO., LTD. (JP) 1983-07-26 US disclosed
JP-S58109483-A COMPOUND CONTAINING BARBITURIC ACID OR THIOBARBITURIC ACID RESIDUE, PHOTOCONDUCTIVE COMPOSITION AND SENSITIZED MATERIAL FOR ELECTROPHOTOGRAPHY CONTAINING IT FUJI PHOTO FILM CO LTD 1983-06-29 JP disclosed