Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 3/20 | 0.58 |
| ▸ | ESR2 | Q92731 | 3/20 | 0.58 |
| ▸ | NOTUM | Q6P988 | 1/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.51 |
| ▸ | MAPT | P10636 | 3/20 | 0.51 |
| ▸ | HPGD | P15428 | 3/20 | 0.51 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.51 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.51 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.51 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.49 |
| ▸ | PDE5A | O76074 | 2/20 | 0.49 |
| ▸ | POLB | P06746 | 1/20 | 0.49 |
| ▸ | RAB9A | P51151 | 2/20 | 0.47 |
| ▸ | NPC1 | O15118 | 1/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.47 |
| ▸ | AR | P10275 | 1/20 | 0.47 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.47 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29488279 | 1.00 | ESR1 (0.58) | ESR1ESR2NOTUMALDH1A1MAPT | |
| SCHEMBL29514776 | 0.86 | ESR1 (0.73) | ESR1ESR2ALDH1A1MAPTHPGD | |
| SCHEMBL194068 | 0.86 | ESR1 (0.73) | ESR1ESR2ALDH1A1MAPTHPGD | |
| SCHEMBL26261632 | 0.84 | NOTUM (0.67) | ESR1ESR2NOTUMALDH1A1MAPT | |
| Ammonia Solution, Strong SCHEMBL28289396 | 0.84 | ESR1 (0.70) | ESR1ESR2ALDH1A1MAPTHPGD | |
| SCHEMBL28139140 | 0.84 | ESR1 (0.70) | ESR1ESR2ALDH1A1MAPTHPGD | |
| SCHEMBL29538964 | 0.84 | NOTUM (0.57) | NOTUMALDH1A1MAPTHPGDHSD17B10 | |
| SCHEMBL11910167 | 0.84 | NOTUM (0.57) | NOTUMALDH1A1MAPTHPGDHSD17B10 | |
| SCHEMBL26462184 | 0.82 | ESR1 (0.68) | ESR1ESR2ALDH1A1MAPTHPGD | |
| Hydrochloric Acid SCHEMBL30562865 | 0.81 | NOTUM (0.55) | ESR1ESR2NOTUMALDH1A1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12353130-B2 | Photosensitive resin composition and photosensitive resin multilayer body | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2025-07-08 | — | — | US | disclosed |
| US-20240408595-A1 | STRUCTURE COMPRISING MICROCHANNEL, PRODUCTION METHOD FOR SAID STRUCTURE, AND MICROCHANNEL DEVICE | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-12-12 | — | — | US | disclosed |
| US-12032286-B2 | Method for producing multi-layered type microchannel device using photosensitive resin laminate | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-07-09 | — | — | US | disclosed |
| CN-118119565-A | Structure having micro-channel, method for manufacturing same, and micro-channel device | 旭化成株式会社 | 2024-05-31 | — | — | CN | disclosed |
| US-20240059803-A1 | PHOTOSENSITIVE RESIN MULTILAYER BODY AND METHOD FOR PRODUCING SAME | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-02-22 | — | — | US | disclosed |
| US-20230375930-A1 | PHOTOSENSITIVE RESIN MULTILAYER BODY | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2023-11-23 | — | — | US | disclosed |
| CN-116981999-A | Photosensitive resin laminate and method for producing same | 旭化成株式会社 | 2023-10-31 | — | — | CN | disclosed |
| CN-111315828-B | Composition, cured product, optical filter, and method for producing cured product | 株式会社艾迪科 | 2023-09-29 | — | — | CN | disclosed |
| CN-111694218-B | Photosensitive resin composition and method for forming circuit pattern | 旭化成株式会社 | 2023-09-08 | — | — | CN | disclosed |
| CN-112154167-B | Composition, cured product, optical filter, and method for producing cured product | 株式会社艾迪科 | 2023-08-22 | — | — | CN | disclosed |
| CN-111596526-A | Photosensitive resin composition and photosensitive resin laminate | 旭化成株式会社 | 2020-08-28 | — | — | CN | disclosed |
| CN-111527450-A | Photosensitive resin laminate and method for producing same | 旭化成株式会社 | 2020-08-11 | — | — | CN | disclosed |
| CN-106462068-B | Photosensitive resin composition and method for forming circuit pattern | 旭化成株式会社 | 2020-07-24 | — | — | CN | disclosed |
| CN-106966074-B | Photosensitive resin laminate roll | 旭化成株式会社 | 2020-05-05 | — | — | CN | disclosed |
| CN-106918993-B | Photosensitive resin composition, photosensitive resin laminate, and method for forming protective pattern | 旭化成株式会社 | 2020-03-10 | — | — | CN | disclosed |
| WO-2020021969-A1 | COMPOSITION, CURED PRODUCT, OPTICAL FILTER, AND PRODUCTION METHOD FOR CURED PRODUCT | 株式会社ADEKA | 2020-01-30 | — | — | WO | disclosed |
| EP-3339331-A1 | COMPOSITION | Adeka Corporation (JP) | 2018-06-27 | — | — | EP | disclosed |
| EP-0305545-B1 | SUBSTITUTED ACRIDINE DERIVATIVES AND THEIR USE | Hitachi Chemical Co., Ltd. (JP) | 1993-02-10 | — | — | EP | disclosed |
| US-5045433-A | Photopolymerization initiators | HITACHI CHEMICAL CO., LTD. (JP) | 1991-09-03 | — | — | US | disclosed |
| EP-0305545-A1 | SUBSTITUTED ACRIDINE DERIVATIVES AND THEIR USE | Hitachi Chemical Co., Ltd. (JP) | 1989-03-08 | — | — | EP | disclosed |