SCHEMBL960841

SCHEMBL960841

[CH]1CCCCC12[CH]CCCC2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1397180 0.97
SCHEMBL14917380 0.97
SCHEMBL14916868 0.97
SCHEMBL1713452 0.89
SCHEMBL2471351 0.89
SCHEMBL1397189 0.87
SCHEMBL14917368 0.86
SCHEMBL14917413 0.84
SCHEMBL8529518 0.78
SCHEMBL14917295 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11952447-B2 Polymerizable composition for dental material, and dental material obtained from said composition MITSUI CHEMICALS, INC. (JP) 2024-04-09 US disclosed
US-20230303539-A1 IMMUNOREGULATORY COMPOUND AND ANTITUMOR APPLICATION THEREOF SHANGHAITECH UNIVERSITY (CN) 2023-09-28 US disclosed
EP-4198030-A1 IMMUNOREGULATORY COMPOUND AND ANTITUMOR APPLICATION THEREOF Shanghaitech University (CN) 2023-06-21 EP disclosed
EP-3777816-A1 POLYMERIZABLE COMPOSITION FOR DENTAL MATERIAL, AND DENTAL MATERIAL OBTAINED FROM SAID COMPOSITION Mitsui Chemicals, Inc. (JP) 2021-02-17 EP disclosed
US-20210017313-A1 POLYMERIZABLE COMPOSITION FOR DENTAL MATERIAL, AND DENTAL MATERIAL OBTAINED FROM SAID COMPOSITION MITSUI CHEMICALS, INC. (JP) 2021-01-21 US disclosed
EP-2539316-B1 LATENT ACIDS AND THEIR USE BASF SE (DE) 2019-10-23 EP disclosed
US-8580478-B2 Latent acids and their use BASF SE (DE) 2013-11-12 US disclosed
US-20130115543-A1 THERMOSTABLE POLYMER ELECTROLYTE MEMBRANE AND PROCESS FOR PRODUCING THE SAME JAPAN ATOMIC ENERGY AGENCY (JP) 2013-05-09 US disclosed
EP-1472576-B1 SULFONATE DERIVATIVES AND THE USE THEROF AS LATENT ACIDS BASF SE (DE) 2013-04-24 EP disclosed
US-8426626-B2 Compound having asymmetric carbon atom, oxidation-reduction reaction causing portion, and liquid crystal substituent FUJIFILM CORPORATION (JP) 2013-04-23 US disclosed
WO-2007147782-A2 OXIME SULFONATES AND THE USE THEROF AS LATENT ACIDS CIBA HOLDING INC. (CH) 2007-12-27 WO disclosed
US-7244544-B2 Oxime derivatives and the use thereof as latent acids CIBA SPECIALTY CHEMICALS CORPORATION (US) 2007-07-17 US disclosed
US-20060068325-A1 Oxime derivatives and the use thereof as latent acids YAMATO HITOSHI 2006-03-30 US disclosed
US-6986981-B2 Oxime derivatives and the use thereof as latent acids CIBA SPECIALTY CHEMICALS CORPORATION (US) 2006-01-17 US disclosed
US-20050153244-A1 Sulfonate derivatives and the use thereof as latent acids CIBA SPECIALTY CHEMICALS CORP. 2005-07-14 US disclosed
EP-1472576-A2 SULFONATE DERIVATIVES AND THE USE THEROF AS LATENT ACIDS Ciba SC Holding AG (CH) 2004-11-03 EP disclosed
US-20040002007-A1 Oxime derivatives and the use thereof as latent acids CIBA SPECIALTY CHEMICALS CORP. 2004-01-01 US disclosed
WO-2003067332-A2 SULFONATE DERIVATIVES AND THE USE THEROF AS LATENT ACIDS CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2003-08-14 WO disclosed
EP-1320785-A2 OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS Ciba SC Holding AG (CH) 2003-06-25 EP disclosed
WO-2002025376-A2 OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2002-03-28 WO disclosed