⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29943761 | 0.80 | USP2 (0.39) | — | |
| SCHEMBL28457587 | 0.72 | — | — | |
| SCHEMBL2661956 | 0.72 | — | — | |
| SCHEMBL29943683 | 0.71 | USP2 (0.32) | — | |
| SCHEMBL546315 | 0.69 | CA14 (0.33) | — | |
| SCHEMBL2564331 | 0.69 | — | — | |
| SCHEMBL3208293 | 0.69 | USP2 (0.41) | — | |
| SCHEMBL1772672 | 0.69 | — | — | |
| SCHEMBL28461448 | 0.69 | — | — | |
| SCHEMBL30488645 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120135348-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2012-05-31 | — | — | US | disclosed |
| EP-1764647-A2 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJIFILM Corporation (JP) | 2007-03-21 | — | — | EP | disclosed |