SCHEMBL9617987

SCHEMBL9617987

CC1CCC[C@H]2C(=O)OC(=O)[C@H]12

nearest known ligand 0.40

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
▸ CYP2D6 P10635 2/20 0.40
▸ KDM4E B2RXH2 1/20 0.40
▸ GMNN O75496 1/20 0.40
▸ PPM1B O75688 1/20 0.40
▸ LMNA P02545 1/20 0.40
▸ PPP1CC P36873 1/20 0.40
▸ TFPI2 P48307 1/20 0.40
▸ RAB9A P51151 1/20 0.40
▸ PPP5C P53041 1/20 0.40
▸ PPP1CA P62136 1/20 0.40
▸ PMP22 Q01453 1/20 0.40
▸ SMN1; SMN2 Q16637 1/20 0.40
▸ TDP1 Q9NUW8 1/20 0.40
▸ TP53 P04637 1/20 0.40
▸ NFKB1 P19838 1/20 0.40
▸ THPO P40225 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL266400 1.00 CYP2D6 (0.40) CYP2D6KDM4EGMNNPPM1BLMNA
SCHEMBL9617985 1.00 CYP2D6 (0.40) CYP2D6KDM4EGMNNPPM1BLMNA
SCHEMBL20576847 0.96 KDM4E (0.38) CYP2D6KDM4EGMNNPPM1BLMNA
SCHEMBL13685797 0.87 KDM4E (0.43) CYP2D6KDM4EGMNNPPM1BLMNA
SCHEMBL12664891 0.78 KDM4E (0.43) CYP2D6KDM4EGMNNPPM1BLMNA
SCHEMBL15463210 0.77 KDM4E (0.35) CYP2D6KDM4EGMNNPPM1BLMNA
SCHEMBL10519002 0.77 SMN1; SMN2 (0.50) CYP2D6KDM4EGMNNPPM1BLMNA
SCHEMBL15806555 0.77 SMN1; SMN2 (0.50) CYP2D6KDM4EGMNNPPM1BLMNA
SCHEMBL336246 0.77 KDM4E (0.42) CYP2D6KDM4EGMNNPPM1BLMNA
SCHEMBL18923859 0.77 KDM4E (0.42) CYP2D6KDM4EGMNNPPM1BLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-4076020-A — — None — — JP disclosed
JP-H0476020-A EPOXY RESIN COMPOSITION NEW JAPAN CHEM CO LTD 1992-03-10 — — JP disclosed
US-4198340-A ALKALI METAL COMPOUND AS CATALYST DAINIPPON INK & CHEMICALS, INC. (JP) 1980-04-15 — — US disclosed
JP-H00476020-A — — 0001-01-01 — — JP disclosed
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