Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP19A1 | P11511 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6551405 | 0.98 | CYP19A1 (0.50) | CYP19A1 | |
| SCHEMBL15759126 | 0.85 | CYP19A1 (0.41) | CYP19A1 | |
| SCHEMBL9626953 | 0.82 | CYP19A1 (0.47) | CYP19A1 | |
| SCHEMBL914140 | 0.82 | CYP19A1 (0.34) | CYP19A1 | |
| SCHEMBL31628749 | 0.80 | CYP19A1 (0.43) | CYP19A1 | |
| SCHEMBL25397835 | 0.80 | CYP19A1 (0.53) | CYP19A1 | |
| SCHEMBL5702525 | 0.80 | CYP19A1 (0.49) | CYP19A1 | |
| SCHEMBL5702529 | 0.80 | CYP19A1 (0.53) | CYP19A1 | |
| SCHEMBL118423 | 0.80 | CYP19A1 (0.49) | CYP19A1 | |
| SCHEMBL8356622 | 0.79 | CYP19A1 (0.42) | CYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025126793-A1 | METHOD FOR PRODUCING POLYCARBOXYLIC ACID ESTER COMPOUND | 本州化学工業株式会社 | 2025-06-19 | — | — | WO | disclosed |
| WO-2025126794-A1 | METHOD FOR PRODUCING POLYCARBOXYLIC ACID ESTER COMPOUND | 本州化学工業株式会社 | 2025-06-19 | — | — | WO | disclosed |
| US-11061326-B2 | Chemical amplification type positive photosensitive resin composition, a photosensitive dry film, a method for producing a photosensitive dry film, a method for producing a patterned resist film, a method of manufacturing a template with a substrate, and a method of manufacturing a plated shaped product, and a Mercapto compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-07-13 | — | — | US | disclosed |
| WO-2021049592-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMATION METHOD, AND RADIATION-SENSITIVE ACID GENERATOR | JSR株式会社 | 2021-03-18 | — | — | WO | disclosed |
| US-20190101825-A1 | CHEMICAL AMPLIFICATION TYPE POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, A PHOTOSENSITIVE DRY FILM, A METHOD FOR PRODUCING A PHOTOSENSITIVE DRY FILM, A METHOD FOR PRODUCING A PATTERNED RESIST FILM, A METHOD OF MANUFACTURING A TEMPLATE WITH A SUBSTRATE, AND A METHOD OF MANUFACTURING A PLATED SHAPED PRODUCT, AND A MERCAPTO COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-04-04 | — | — | US | disclosed |
| EP-0476865-A1 | Resist material and process for forming pattern using the same | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1992-03-25 | — | — | EP | disclosed |