⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19660279 | 0.80 | — | — | |
| SCHEMBL1024758 | 0.72 | — | — | |
| SCHEMBL4271079 | 0.67 | — | — | |
| SCHEMBL6569977 | 0.67 | — | — | |
| SCHEMBL9630230 | 0.65 | — | — | |
| SCHEMBL11965845 | 0.60 | — | — | |
| SCHEMBL11965844 | 0.60 | — | — | |
| SCHEMBL1469763 | 0.60 | — | — | |
| SCHEMBL22407244 | 0.60 | — | — | |
| SCHEMBL12128853 | 0.60 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115926143-B | Silicon-containing end-capped polyether compound, preparation method thereof and application thereof in slump retaining agent | 科之杰新材料集团有限公司 | 2024-07-16 | — | — | CN | disclosed |
| US-5158854-A | Ladder polymers having hydrophilic groups | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 1992-10-27 | — | — | US | disclosed |
| EP-0232167-B1 | PHOTOSENSITIVE AND HIGH ENERGY BEAM SENSITIVE RESIN COMPOSITION CONTAINING SUBSTITUTED POLYSILOXANE | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 1988-12-28 | — | — | EP | disclosed |
| EP-0232167-A2 | Photosensitive and high energy beam sensitive resin composition containing substituted polysiloxane | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 1987-08-12 | — | — | EP | disclosed |