SCHEMBL963036

SCHEMBL963036

CCO[Si](C)(CCCN)OC(C)(CCO)CCO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28882209 0.92 CYP4F2 (0.31)
SCHEMBL1426868 0.89
SCHEMBL1070846 0.83
SCHEMBL83456 0.83
SCHEMBL1068847 0.78
Alcohol SCHEMBL28827022 0.77 CYP1A2 (0.33)
SCHEMBL5413525 0.77
SCHEMBL10411104 0.76
SCHEMBL37811 0.75 CYP1A2 (0.32)
SCHEMBL28353205 0.75 CYP4F2 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3340252-A1 ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP claimed
EP-3340253-A1 UV-RESISTANT ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP claimed
CN-110591019-B Modified acrylic resin solution and preparation method thereof, anticorrosive paint and application thereof 科诺思膜技术(厦门)有限公司 2021-02-05 CN disclosed
CN-107209303-B Far infrared ray reflective film, dispersion for forming far infrared ray reflective film, method for producing far infrared ray reflective film, far infrared ray reflective glass, and window 富士胶片株式会社 2020-07-14 CN disclosed
US-10589494-B2 Far infrared reflective film, dispersion for forming far infrared reflective film, manufacturing method of far infrared reflective film, far infrared reflective glass, and window FUJIFILM CORPORATION (JP) 2020-03-17 US disclosed
CN-110591019-A Modified acrylic resin solution and preparation method thereof, anticorrosive paint and application thereof 科诺思膜技术(厦门)有限公司 2019-12-20 CN disclosed
EP-3340253-A1 UV-RESISTANT ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP disclosed
EP-3340252-A1 ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP disclosed
US-20180079917-A1 HEAT INSULATION PAINT FUJIFILM CORPORATION (JP) 2018-03-22 US disclosed
US-20170320302-A1 FAR INFRARED REFLECTIVE FILM, DISPERSION FOR FORMING FAR INFRARED REFLECTIVE FILM, MANUFACTURING METHOD OF FAR INFRARED REFLECTIVE FILM, FAR INFRARED REFLECTIVE GLASS, AND WINDOW FUJIFILM CORPORATION (JP) 2017-11-09 US disclosed
EP-3125323-A1 SOLAR CELL Fujifilm Corporation (JP) 2017-02-01 EP disclosed
US-20150004327-A1 CONDUCTIVE MEMBER AND METHOD FOR MANUFACTURING SAME FUJIFILM CORPORATION (JP) 2015-01-01 US disclosed
US-20140069488-A1 CONDUCTIVE MEMBER, METHOD OF PRODUCING THE SAME, TOUCH PANEL, AND SOLAR CELL FUJIFILM CORPORATION (JP) 2014-03-13 US disclosed
US-20140048131-A1 CONDUCTIVE MEMBER, PRODUCTION METHOD OF THE SAME, TOUCH PANEL, AND SOLAR CELL FUJIFILM CORPORATION (JP) 2014-02-20 US disclosed
US-20140034360-A1 CONDUCTIVE MEMBER, PRODUCTION METHOD OF THE SAME, TOUCH PANEL, AND SOLAR CELL FUJIFILM CORPORATION (JP) 2014-02-06 US disclosed
EP-2600359-A1 Magnetic core-shell particle Evonik Degussa GmbH (DE) 2013-06-05 EP disclosed
US-20110000658-A1 HYDROPHILIC MEMBER FUJIFILM CORPORATION (JP) 2011-01-06 US disclosed
EP-2239137-A1 HYDROPHILIC MEMBERS FUJIFILM Corporation (JP) 2010-10-13 EP disclosed
EP-0409411-A2 Magnetic recording medium with cured surface coating MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1991-01-23 EP disclosed
US-4529659-A Magnetic recording member and process for manufacturing the same NIPPON TELEGRAPH & TELEPHONE PUBLIC CORPORATION (JP) 1985-07-16 US disclosed