Biphenyl

Biphenyl

SCHEMBL9637830

Cc1ccc(OP(=O)(O)O)cc1.c1ccc(-c2ccccc2)cc1

nearest known ligand 0.64

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SRC P12931 1/20 0.64
CYP3A4 P08684 2/20 0.53
TSHR P16473 1/20 0.53
MEN1 O00255 5/20 0.49
KMT2A Q03164 5/20 0.49
LMNA P02545 2/20 0.49
MAPT P10636 2/20 0.49
NPSR1 Q6W5P4 1/20 0.47
BLM P54132 1/20 0.47
CA1 P00915 1/20 0.44
CA2 P00918 1/20 0.44
ALDH1A1 P00352 1/20 0.44
PTK2B Q14289 1/20 0.44
RXFP1 Q9HBX9 1/20 0.44
PTPN5 P54829 1/20 0.44
INPPL1 O15357 2/20 0.43
INPP5A Q14642 2/20 0.43
HSP90AA1 P07900 1/20 0.43
GAA P10253 1/20 0.43
NPC1 O15118 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1043482 0.90 TSHR (0.59) SRCCYP3A4TSHRMEN1KMT2A
Phenyl Dihydrogen Phosphate SCHEMBL27750193 0.90 SRC (0.79) SRCCYP3A4TSHRMEN1KMT2A
Biphenyl SCHEMBL17782089 0.89 CYP3A4 (0.53) SRCCYP3A4TSHRMEN1KMT2A
Biphenyl SCHEMBL27733067 0.88 SRC (0.75) SRCBLMCA1CA2ALDH1A1
SCHEMBL2214337 0.88 SRC (0.75) SRCBLMCA1CA2ALDH1A1
SCHEMBL187454 0.88 TSHR (0.67) SRCCYP3A4TSHRMEN1KMT2A
O-Xylene SCHEMBL29031714 0.87 SRC (0.61) SRCCYP3A4TSHRMEN1KMT2A
Phenyl Dihydrogen Phosphate SCHEMBL27269289 0.86 SRC (0.79) SRCCYP3A4TSHRMEN1KMT2A
Water SCHEMBL27699573 0.86 SRC (0.72) SRCBLMCA1CA2ALDH1A1
Biphenyl SCHEMBL6118426 0.86 SRC (0.86) SRCBLMCA1CA2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108473649-A High modulus thermoplastic polyurethane 路博润先进材料公司 2018-08-31 CN disclosed
CN-108368226-A CRYSTALLINE HIGH MODULUS THERMOPLASTIC POLYURETHANE 路博润先进材料公司 2018-08-03 CN disclosed
CN-103906779-A Process for producing polyurethanes BASF SE 2014-07-02 CN disclosed
CN-102549500-B Dry film photoresist KOLON INC 2014-04-30 CN disclosed
CN-102549499-B Dry film photoresist KOLON INC 2013-09-11 CN disclosed
CN-102549499-A Dry film photoresist KOLON INC 2012-07-04 CN disclosed
CN-102549500-A Dry film photoresist KOLON INC 2012-07-04 CN disclosed
CN-100536271-C System for sealing an opening in a wall of a feed-through for a transport device and method thereof BEELE ENG BV (NL) 2009-09-02 CN disclosed
CN-1918763-A System and method for sealing an opening in a wall in which at least one transport device such as a cable, conduit or tube has been fed through BEELE ENG BV (NL) 2007-02-21 CN disclosed
EP-0273752-B1 METHOD OF MANUFACTURING HEAT SENSITIVE RECORDING MATERIAL FUJI PHOTO FILM CO., LTD. (JP) 1992-08-19 EP disclosed
US-5047308-A Microencapsulationof diazo compound or coupler FUJI PHOTO FILM CO., LTD. (JP) 1991-09-10 US disclosed
US-5028580-A Heat sensitive recording material FUJI PHOTO FILM CO., LTD. (JP) 1991-07-02 US disclosed
US-4999333-A For facsimile and thermal printing FUJI PHOTO FILM CO., LTD. (JP) 1991-03-12 US disclosed
US-4956251-A Multilayer, multicolor recording media, radiation transparent protective coatings FUJI PHOTO FILM CO., LTD. (JP) 1990-09-11 US disclosed
US-4929411-A Heat-sensitive recording material FUJI PHOTO FILM CO., LTD. (JP) 1990-05-29 US disclosed
US-4857501-A THERMOGRAPHY FUJI PHOTO FILM CO., LTD. (JP) 1989-08-15 US disclosed
US-4845071-A FOR OVERHEAD PROJECTORS FUJI PHOTO FILM CO., LTD. (JP) 1989-07-04 US disclosed
US-4840933-A TRANSPARENT FUJI PHOTO FILM CO., LTD. (JP) 1989-06-20 US disclosed
US-4820682-A EMULSIFIED DYE PRECURSOR COATING, SILICON MODIFIED POLYVINYL ALCOHOL LAYER ON TRANSPARENT SUPPORT; FOR OVERHEAD PROJECTORS FUJI PHOTO FILM CO., LTD. (JP) 1989-04-11 US disclosed
EP-0273752-A2 Method of manufacturing heat sensitive recording material FUJI PHOTO FILM CO., LTD. (JP) 1988-07-06 EP disclosed