Acrylic Acid

Acrylic Acid

SCHEMBL9640960

C=CC(=O)O.C=CC(=O)O.C=CC(=O)O.CCC.COC(OC)(C(=O)c1ccccc1)c1ccccc1

nearest known ligand 0.73

Full drug profile on Sugi Atlas →

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CES1 P23141 3/20 0.73
SRC P12931 1/20 0.41
AKT1 P31749 2/20 0.40
TSHR P16473 3/20 0.37
ALDH1A1 P00352 3/20 0.37
KCNN4 O15554 1/20 0.37
HTT P42858 1/20 0.36
MAPK1 P28482 1/20 0.35
LMNA P02545 1/20 0.35
MAPT P10636 1/20 0.35
CES2 O00748 1/20 0.34
MEN1 O00255 1/20 0.34
CYP3A4 P08684 1/20 0.34
KMT2A Q03164 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acrylic Acid SCHEMBL10353170 0.87 CES1 (0.67) CES1SRCAKT1TSHRALDH1A1
Alcohol SCHEMBL28270850 0.86 CES1 (0.86) CES1SRCAKT1TSHRALDH1A1
SCHEMBL28324796 0.86 CES1 (0.93) CES1SRCTSHRALDH1A1KCNN4
Formaldehyde SCHEMBL28114609 0.86 CES1 (0.93) CES1SRCTSHRALDH1A1KCNN4
Formaldehyde SCHEMBL1128921 0.86 CES1 (0.93) CES1SRCTSHRALDH1A1KCNN4
SCHEMBL15173 0.86 CES1 (1.00) CES1SRCTSHRALDH1A1KCNN4
SCHEMBL1679763 0.86 CES1 (1.00) CES1SRCTSHRALDH1A1KCNN4
SCHEMBL608102 0.85 CES1 (0.78) CES1SRCTSHRALDH1A1KCNN4
Methoxymethane SCHEMBL28719477 0.84 CES1 (0.96) CES1SRCTSHRALDH1A1KCNN4
Formic Acid SCHEMBL29290937 0.83 CES1 (0.86) CES1SRCAKT1TSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0498810-A1 PROCESS FOR THE MANUFACTURE OF PHOTOSENSITIVE MATERIALS HAVING A LOW HEAT HISTORY E.I. DU PONT DE NEMOURS AND COMPANY (US) 1992-08-19 EP disclosed
WO-1991006896-A1 PROCESS FOR THE MANUFACTURE OF PHOTOSENSITIVE MATERIALS HAVING A LOW HEAT HISTORY E.I. DU PONT DE NEMOURS AND COMPANY (US) 1991-05-16 WO disclosed