SCHEMBL965170

SCHEMBL965170

C=C(C)C(C)C(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3880013 0.78
SCHEMBL13362234 0.78
SCHEMBL817685 0.77 TP53 (0.38)
Methylmalonic Acid SCHEMBL128270 0.76 FFAR3 (0.54)
SCHEMBL19003123 0.75
Methylmalonic Acid SCHEMBL27881917 0.75 TP53 (0.57)
Methylmalonic Acid SCHEMBL27766 0.75
SCHEMBL3612036 0.75
SCHEMBL5386710 0.73
SCHEMBL21526281 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 102 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20160316759-A1 MIXTURES COMPRISING A SUPERABSORBENT POLYMER (SAP) AND A BIOPESTICIDE BASF SE (DE) 2016-11-03 US claimed
EP-3082416-A1 MIXTURES COMPRISING A SUPERABSORBENT POLYMER (SAP) AND A BIOPESTICIDE BASF SE (DE) 2016-10-26 EP claimed
WO-2015091967-A1 MIXTURES COMPRISING A SUPERABSORBENT POLYMER (SAP) AND A BIOPESTICIDE BASF SE (DE) 2015-06-25 WO claimed
US-9013658-B2 Method of manufacturing reflective color filter SAMSUNG ELECTRONICS CO., LTD. (KR) 2015-04-21 US claimed
WO-2014178081-A2 MOLECULAR TRAPS FOR CERTAIN UNDESIRABLE MATERIALS ZIM LABORATORIES LIMITED (IN) 2014-11-06 WO claimed
US-8288656-B2 Low temperature curable photosensitive resin composition and dry film manufactured by using the same LG CHEM, LTD. (KR) 2012-10-16 US claimed
US-20110108779-A1 Method of manufacturing reflective color filter SAMSUNG ELECTRONICS CO., LTD. 2011-05-12 US claimed
US-20110067907-A1 LOW TEMPERATURE CURABLE PHOTOSENSITIVE RESIN COMPOSITION AND DRY FILM MANUFACTURED BY USING THE SAME LG CHEM, LTD. (KR) 2011-03-24 US claimed
JP-2007529207-A 2007-10-25 JP claimed
EP-1725674-A1 METHOD FOR THE PRODUCTION OF CHIRAL, SECONDARY ALCOHOLS DSM Fine Chemicals Austria Nfg GmbH & Co KG (AT) 2006-11-29 EP claimed
EP-1692952-A2 Flavouring a foodstuff with compounds containing a sulphur atom linked to two specific atoms or groups QUEST INTERNATIONAL B.V. (NL) 2006-08-23 EP claimed
WO-2005095628-A1 METHOD FOR THE PRODUCTION OF CHIRAL, SECONDARY ALCOHOLS DSM FINE CHEMICALS AUSTRIA NFG GMBH & CO KG (AT) 2005-10-13 WO claimed
US-20040052914-A1 Flavouring a foodstuff by incorporating an effective amount of at least one compound of the formula r1-s-r2 in which r1 and r2 represent a specific atom or group QUEST INTERNATIONAL B.V. (NL) 2004-03-18 US claimed
EP-0835282-B1 IMPROVED PHENOLIC SCORCH RETARDERS SARTOMER CO INC (US) 2003-04-09 EP claimed
WO-2001076390-A2 FLAVOURING A FOODSTUFF WITH COMPOUNDS CONTAINING A SULFUR ATOM LINKED TO TWO SPECIFIC ATOMS OR GROUPS QUEST INTERNATIONAL B.V. (NL) 2001-10-18 WO claimed
EP-1142490-A1 Flavouring a foodstuff with compounds containing a sulphur atom linked to two specific atoms or groups QUEST INTERNATIONAL B.V. (NL) 2001-10-10 EP claimed
EP-0462603-B1 Chlorotrifluoroethylene based copolymer suitable as paint vehicle CENTRAL GLASS CO LTD (JP) 1996-09-25 EP claimed
JP-4279605-A None JP disclosed
EP-0348180-A2 Process for the preparation of water absorptive resin MITSUBISHI PETROCHEMICAL COMPANY LIMITED (JP) 1989-12-27 EP disclosed
US-4113705-A Triisocyanates useful for the production of polyurethane resins BAYER AKTIENGESELLSCHAFT (DE) 1978-09-12 US disclosed