SCHEMBL9667339

SCHEMBL9667339

CC(C)C(=O)c1ccc(C2CCCCC2)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC8 Q9BY41 2/20 0.54
HDAC6 Q9UBN7 2/20 0.54
HDAC1 Q13547 1/20 0.54
HAO1 Q9UJM8 1/20 0.51
DEGS1 O15121 2/20 0.49
HDAC3 O15379 1/20 0.49
HDAC11 Q96DB2 1/20 0.49
RAPGEF3 O95398 1/20 0.46
SMN1; SMN2 Q16637 2/20 0.46
ALDH1A1 P00352 1/20 0.46
MAPT P10636 1/20 0.46
APP P05067 1/20 0.44
KMO O15229 1/20 0.44
NAMPT P43490 1/20 0.43
CYP2C9 P11712 1/20 0.43
BCL2L1 Q07817 1/20 0.43
MCL1 Q07820 1/20 0.43
SLC6A7 Q99884 1/20 0.43
KDM4E B2RXH2 1/20 0.42
GLA P06280 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21565632 0.91 CYP2C9 (0.50) HDAC8HDAC6HDAC1HAO1DEGS1
SCHEMBL27772232 0.88 HDAC8 (0.53) HDAC8HDAC6HDAC1HAO1DEGS1
SCHEMBL17773026 0.85 HAO1 (0.51) HDAC8HDAC6HDAC1HAO1DEGS1
Hydrochloric Acid SCHEMBL9642235 0.85 HDAC8 (0.50) HDAC8HDAC6HDAC1HAO1DEGS1
SCHEMBL29003564 0.84 HDAC8 (0.56) HDAC8HDAC6HDAC1HAO1DEGS1
SCHEMBL10991524 0.82 HDAC8 (0.54) HDAC8HDAC6HDAC1HAO1DEGS1
SCHEMBL11398121 0.82 HDAC8 (0.54) HDAC8HDAC6HDAC1HAO1DEGS1
SCHEMBL13145950 0.81 HAO1 (0.51) HDAC8HDAC6HDAC1HAO1DEGS1
SCHEMBL108577 0.81 HDAC8 (0.46) HDAC8HDAC6HDAC1HAO1DEGS1
SCHEMBL27928265 0.80 HAO1 (0.50) HDAC8HDAC6HDAC1HAO1DEGS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2013069813-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2013-05-16 WO disclosed
US-20110269072-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME FUJIFILM CORPORATION (JP) 2011-11-03 US disclosed
EP-1764647-B1 Use of a positive resist composition for immersion exposure, positive resist composition and immersion lithographic pattern-forming method using the same FUJIFILM CORP (JP) 2011-08-17 EP disclosed
WO-2010114158-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2010-10-07 WO disclosed
EP-0273647-B1 COUMARAN DERIVATIVES, THEIR PRODUCTION AND USE Takeda Chemical Industries, Ltd. (JP) 1992-03-11 EP disclosed
US-4857516-A Coumaran derivatives and their pharmaceutical use TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 1989-08-15 US disclosed
EP-0273647-A1 Coumaran derivatives, their production and use Takeda Chemical Industries, Ltd. (JP) 1988-07-06 EP disclosed