⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7741269 | 0.96 | — | — | |
| SCHEMBL334923 | 0.87 | — | — | |
| SCHEMBL23581796 | 0.86 | — | — | |
| SCHEMBL4531218 | 0.84 | TSHR (0.44) | — | |
| SCHEMBL4530090 | 0.84 | TSHR (0.44) | — | |
| SCHEMBL4530942 | 0.84 | TSHR (0.44) | — | |
| SCHEMBL5575612 | 0.84 | TSHR (0.44) | — | |
| SCHEMBL4519086 | 0.84 | TSHR (0.44) | — | |
| SCHEMBL4531395 | 0.84 | TSHR (0.44) | — | |
| SCHEMBL4530001 | 0.84 | TSHR (0.44) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1841 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122039450-A | Fluorine-free silicon-containing waterproof agent and preparation method and application thereof | 福可新材料(上海)有限公司 | 2026-05-15 | — | — | CN | claimed |
| EP-4638658-A1 | PYROLYSIS OIL PURIFICATION USING SUCCESSIVE EXTRACTIONS | SABIC Global Technologies B.V. (NL) | 2025-10-29 | — | — | EP | claimed |
| EP-4590782-A1 | GAS-PHASE COMPOSITION FOR INHIBITING CORROSION EXPOSED TO CONDENSED WATER | Arkema France (FR) | 2025-07-30 | — | — | EP | claimed |
| CN-119978753-A | Conductive unsaturated polyester resin and preparation method thereof | 安徽正杰科技有限公司 | 2025-05-13 | — | — | CN | claimed |
| CN-118852710-B | Super-hydrophobic polymer composite material for tablecloth and preparation method thereof | 东莞市悠悠美居家居制造有限公司 | 2025-04-25 | — | — | CN | claimed |
| CN-119081323-A | Wear-resistant impact-resistant high polymer floor and preparation process thereof | 洁玛新材料股份有限公司 | 2024-12-06 | — | — | CN | claimed |
| CN-118978827-A | AgBiS2Nanocrystalline ink, preparation method and application thereof in photoelectric device | 苏州大学 | 2024-11-19 | — | — | CN | claimed |
| CN-118561436-B | Efficient corrosion and scale inhibitor and preparation method thereof | 北京鹏发环保集团有限公司 | 2024-11-19 | — | — | CN | claimed |
| CN-118852710-A | Super-hydrophobic polymer composite material for tablecloth and preparation method thereof | 东莞市悠悠美居家居制造有限公司 | 2024-10-29 | — | — | CN | claimed |
| EP-4429802-A1 | MEMBRANE FOR REMOVING ANIONIC MATERIALS | Entegris, Inc. (US) | 2024-09-18 | — | — | EP | claimed |
| JP-2010509777-A | — | — | 2010-03-25 | — | — | JP | claimed |
| EP-2108039-A2 | LIQUID CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES | Advanced Technology Materials, Inc. (US) | 2009-10-14 | — | — | EP | claimed |
| EP-2094825-A2 | FORMULATIONS FOR CLEANING MEMORY DEVICE STRUCTURES | Advanced Technology Materials, Inc. (US) | 2009-09-02 | — | — | EP | claimed |
| WO-2009073596-A2 | FORMULATIONS FOR CLEANING MEMORY DEVICE STRUCTURES | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2009-06-11 | — | — | WO | claimed |
| WO-2008080097-A2 | LIQUID CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2008-07-03 | — | — | WO | claimed |
| US-20080125342-A1 | FORMULATIONS FOR CLEANING MEMORY DEVICE STRUCTURES | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2008-05-29 | — | — | US | claimed |
| WO-2008058173-A2 | FORMULATIONS FOR CLEANING MEMORY DEVICE STRUCTURES | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2008-05-15 | — | — | WO | claimed |
| EP-0575524-B1 | PRODUCTS FOR TREATING GLAUCOMA | MASSACHUSETTS EYE & EAR INFIRM (US) | 2003-03-05 | — | — | EP | claimed |
| US-4163832-A | Polythioethers formed by anionic ring opening of episulfides | EXXON RESEARCH & ENGINEERING CO. (US) | 1979-08-07 | — | — | US | claimed |
| US-4147862-A | Method of preparing styryl-like compounds | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1979-04-03 | — | — | US | claimed |