SCHEMBL9696401

SCHEMBL9696401

SC(S)C1(C(S)S)CCCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16191156 0.67
SCHEMBL20808119 0.65
Cyclohexane SCHEMBL3484424 0.64
SCHEMBL17156268 0.64
Cyclohexane SCHEMBL1936712 0.64
SCHEMBL1795836 0.64
SCHEMBL3361684 0.64
Ammonia Solution, Strong SCHEMBL6032324 0.62
SCHEMBL9450417 0.59
SCHEMBL11823863 0.56

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113227902-A Liquid photopolymer resin composition for flexographic printing 麦克德米德图像方案股份有限公司 2021-08-06 CN disclosed
US-9376524-B2 Composition for forming thermally-cured coating film and thermally-cured coating film FUJIFILM CORPORATION (JP) 2016-06-28 US disclosed
US-20140296426-A1 COMPOSITION FOR FORMING THERMALLY-CURED COATING FILM AND THERMALLY-CURED COATING FILM FUJIFILM CORPORATION (JP) 2014-10-02 US disclosed
US-5109097-A Polyethylenically-unsaturated polyurethane, polyurea and poythiourethane polymers; solvent, wear resistant coatings MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1992-04-28 US disclosed
EP-0327258-A2 Radiation-curable protective coating composition MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1989-08-09 EP disclosed
US-4855184-A Radiation-curable protective coating composition MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1989-08-08 US disclosed