SCHEMBL970065

SCHEMBL970065

CC(CS)CC(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28616510 1.00
Hydrochloric Acid SCHEMBL7710990 0.97
Propylene Glycol SCHEMBL1171056 0.89 TDP1 (0.43)
Di(Hydroxyethyl)Ether SCHEMBL29029861 0.83 TSHR (0.39)
SCHEMBL258152 0.82 SLC22A6 (0.50)
SCHEMBL8373329 0.80 FOLH1 (0.44)
SCHEMBL11112412 0.79 SLC22A6 (0.47)
SCHEMBL10902055 0.79 SLC22A6 (0.47)
Ammonia Solution, Strong SCHEMBL28582304 0.79 TDP1 (0.53)
SCHEMBL14109598 0.79 SLC22A6 (0.47)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210177721-A1 FRAGRANCE MATERIALS PROCTER & GAMBLE (US) 2021-06-17 US claimed
US-12509609-B2 Curable resin composition, resin cured film, partition wall and optical element AGC Inc. (JP) 2025-12-30 US disclosed
US-20240392157-A1 CURABLE RESIN COMPOSITION, RESIN CURED FILM, PARTITION WALL AND OPTICAL ELEMENT AGC Inc. (JP) 2024-11-28 US disclosed
CN-118660924-A Curable resin composition, resin cured film, partition wall, and optical element AGC株式会社 2024-09-17 CN disclosed
WO-2023149406-A1 CURABLE RESIN COMPOSITION, RESIN CURED FILM, PARTITION WALL AND OPTICAL ELEMENT AGC株式会社 2023-08-10 WO disclosed
CN-107746202-B Environment-friendly multifunctional unsaturated resin dispersant and preparation process thereof 东莞市立信环保科技有限公司 2021-03-30 CN disclosed
CN-109864897-A Personal care composition 宝洁公司 2019-06-11 CN disclosed
CN-109568166-A Fragrance material 宝洁公司 2019-04-05 CN disclosed
CN-108473528-A High intensity sweetner 赛诺米克斯公司 2018-08-31 CN disclosed
CN-108473484-A Compounds useful as TRPM8 modulators 赛诺米克斯公司 2018-08-31 CN disclosed
CN-1388120-A Intermediate used as new industrial products in preparation of new cephalosporin containing sbstituted benzyloxy imino on 7-position ROUSSEL UCLAF (FR) 2003-01-01 CN disclosed
US-6361872-B1 CORROSION RESISTANCE FOR METAL SURFACES WITH MERCAPTO COMPOUNDS AND CURING AGENTS METAL COATINGS INTERNATIONAL INC. 2002-03-26 US disclosed
CN-1061045-C Process for the preparation of novel cephalosporins containing a substituted benzyloxyimino group in position 7 ROUSSEL UCLAF (FR) 2001-01-24 CN disclosed
CN-1178671-A Method for preparing novel cephalosporin medicine composition containing substituted benzyloxy imino on the 7 th position ROUSSEL UCLAF CO (FR) 1998-04-15 CN disclosed
US-5710147-A ANTIBIOTICS ROUSSEL UCLAF (FR) 1998-01-20 US disclosed
CN-1152575-A Novel cephalosporins containing a substituted benzyloxyimino group in position 7, process and intermediates for their preparation and their use as medicaments ROUSSEL UCLAF (FR) 1997-06-25 CN disclosed
US-5639770-A SUPEROXIDE INHIBITOR OTSUKA PHARMACEUTICAL CO., LTD. (JP) 1997-06-17 US disclosed
CN-1096298-A Contain the novel cephalosporin of the oxyimino group of replacement, their preparation method and intermediate on seven and as the purposes of medicine ROUSSEL UCLAF (FR) 1994-12-14 CN disclosed
EP-0600092-A1 THIAZOLE DERIVATIVE OTSUKA PHARMACEUTICAL CO., LTD. (JP) 1994-06-08 EP disclosed
CN-1073177-A Novel cephalosporins containing a substituted benzyloxyimino radical in position 7, process for their preparation and their use as medicaments ROUSSEL UCLAF (FR) 1993-06-16 CN disclosed