SCHEMBL9704956

SCHEMBL9704956

N#CC1=NN(c2ccccc2)C(=O)C1/N=N/c1cccc(S(=O)(=O)NCC(=O)O)c1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 6/20 0.46
▸ MEN1 O00255 5/20 0.46
▸ NPC1 O15118 2/20 0.46
▸ ALDH1A1 P00352 5/20 0.43
▸ MAPT P10636 4/20 0.43
▸ SMN1; SMN2 Q16637 3/20 0.43
▸ LMNA P02545 2/20 0.43
▸ TDP1 Q9NUW8 2/20 0.43
▸ MAPK1 P28482 1/20 0.43
▸ RAB9A P51151 1/20 0.43
▸ CYP1A2 P05177 2/20 0.41
▸ GAA P10253 2/20 0.41
▸ CYP2D6 P10635 1/20 0.39
▸ CYP2C9 P11712 1/20 0.39
▸ KDM4E B2RXH2 2/20 0.38
▸ POLB P06746 1/20 0.38
▸ L3MBTL1 Q9Y468 1/20 0.38
▸ ATM Q13315 1/20 0.37
▸ APEX1 P27695 1/20 0.36
▸ GRIN2D O15399 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9704968 1.00 KMT2A (0.46) KMT2AMEN1NPC1ALDH1A1MAPT
SCHEMBL9704960 1.00 KMT2A (0.46) KMT2AMEN1NPC1ALDH1A1MAPT
SCHEMBL14255282 0.75 MEN1 (0.71) KMT2AMEN1NPC1ALDH1A1MAPT
SCHEMBL14077245 0.74 MAPT (0.53) KMT2AMEN1NPC1ALDH1A1MAPT
SCHEMBL14255268 0.70 MEN1 (0.48) KMT2AMEN1NPC1ALDH1A1MAPT
SCHEMBL14543158 0.67 MEN1 (0.44) KMT2AMEN1NPC1ALDH1A1MAPT
SCHEMBL11683104 0.67 KMT2A (0.42) KMT2AMEN1NPC1ALDH1A1MAPT
SCHEMBL11683098 0.67 KMT2A (0.42) KMT2AMEN1NPC1ALDH1A1MAPT
SCHEMBL14255086 0.66 MAPT (0.44) KMT2AMEN1NPC1ALDH1A1MAPT
SCHEMBL10623315 0.64 MAPT (0.65) KMT2AMEN1NPC1ALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0504759-A1 Photoresist pattern-forming process suitable for integrated circuit production EASTMAN KODAK COMPANY (US) 1992-09-23 — — EP disclosed
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