SCHEMBL9715870

SCHEMBL9715870

CCC=C[SiH](Cl)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17966590 0.89
SCHEMBL28817792 0.78
SCHEMBL5324088 0.75
SCHEMBL3481860 0.75
SCHEMBL21383052 0.75
SCHEMBL20601877 0.69
SCHEMBL1147762 0.69
SCHEMBL4073734 0.69
SCHEMBL1262058 0.69
SCHEMBL3482519 0.68

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115216016-B Solid polysilazane and preparation method and application thereof 中国科学院化学研究所 2024-03-22 CN disclosed
CN-113444121-B Method for removing ethyl dichlorosilane impurities in dimethyl dichlorosilane 天津大学 2023-02-07 CN disclosed
CN-115216016-A Solid polysilazane and preparation method and application thereof 中国科学院化学研究所 2022-10-21 CN disclosed
CN-115215892-A Carbosilane photosensitive monomer and preparation method and application thereof 中国科学院化学研究所 2022-10-21 CN disclosed
CN-113444121-A Method for removing ethyl dichlorosilane impurities in dimethyl dichlorosilane 天津大学 2021-09-28 CN disclosed
EP-3135711-B1 COPOLYMERIZED POLYSILAZANE, MANUFACTURING METHOD THEREFOR, COMPOSITION COMPRISING SAME, AND METHOD FOR FORMING SILICEOUS FILM USING SAME MERCK PATENT GMBH (DE) 2021-07-07 EP disclosed
CN-108865303-B Coal water slurry additive containing sulfonic acid group and preparation method thereof 义乌市牛尔科技有限公司 2021-07-06 CN disclosed
EP-3768732-A1 PROCESS FOR FUNCTIONALIZATION OF ORGANO-ZINC COMPOUNDS WITH HALOSILANES USING BASIC NITROGEN CONTAINING HETEROCYCLES AND SILYL-FUNCTIONALIZED COMPOUNDS PREPARED THEREBY Dow Global Technologies LLC (US) 2021-01-27 EP disclosed
EP-3768733-A1 SILICON-TERMINATED TELECHELIC POLYOLEFIN COMPOSITIONS AND PROCESSES FOR PREPARING THE SAME Dow Global Technologies LLC (US) 2021-01-27 EP disclosed
US-20210017195-A1 PROCESS FOR FUNCTIONALIZATION OF ORGANO-ZINC COMPOUNDS WITH HALOSILANES USING BASIC NITROGEN CONTAINING HETEROCYCLES AND SILYL-FUNCTIONALIZED COMPOUNDS PREPARED THEREBY DOW GLOBAL TECHNOLOGIES LLC (US) 2021-01-21 US disclosed
US-20170044401-A1 COPOLYMERIZED POLYSILAZANE, MANUFACTURING METHOD THEREFOR, COMPOSITION COMPRISING SAME, AND METHOD FOR FORMING SILICEOUS FILM USING SAME AZ ELECTRONIC MATERIALS S.À R.L. (LU) 2017-02-16 US disclosed
US-8791221-B2 Addition-curable metallosiloxane compound DAICEL CORPORATION (JP) 2014-07-29 US disclosed
EP-2650319-A1 ADDITION-CURABLE METALLOSILOXANE COMPOUND Daicel Corporation (JP) 2013-10-16 EP disclosed
US-20130267653-A1 ADDITION-CURABLE METALLOSILOXANE COMPOUND DAICEL CORPORATION (JP) 2013-10-10 US disclosed
CN-1807238-A Special type organochlorosilane preparation method HANGZHOU TEACHERS COLLEGE (CN) 2006-07-26 CN disclosed
US-5098981-A POLYORGANOSILOXANE CHISSO CORPORATION (JP) 1992-03-24 US disclosed
EP-0349920-A2 Polyorganosiloxane Chisso Corporation (JP) 1990-01-10 EP disclosed
EP-0012566-B1 ELECTRIC WINDINGS AND PRODUCTION THEREOF Hitachi, Ltd. (JP) 1983-06-22 EP disclosed
US-4269894-A AS BINDERS FOR THE MULTILAYERED INSULATION; IMPREGNATING WITH A VARNISH OF EPOXY-ISOCYANATE RESIN; WATERPROOFING HITACHI, LTD. (JP) 1981-05-26 US disclosed
EP-0012566-A1 Electric windings and production thereof Hitachi, Ltd. (JP) 1980-06-25 EP disclosed