SCHEMBL971845

SCHEMBL971845

C=CN(C)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10058215 0.76 MEN1 (0.33)
SCHEMBL19672901 0.76
SCHEMBL23720954 0.74
SCHEMBL21538497 0.74
SCHEMBL14191798 0.74 MEN1 (0.41)
SCHEMBL4259474 0.74 CA12 (0.30)
SCHEMBL449642 0.73
SCHEMBL7532749 0.73
SCHEMBL4257777 0.72 CA12 (0.35)
SCHEMBL15161810 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 131 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240150511-A1 WEAK BASE ANION RESIN POLYMERS COMPRISING ALKYLAMINE SEGMENTS AND CROSS-LINKING SEGMENTS, AND THEIR METHODS OF USE IN ION EXCHANGE U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS COLLATERAL AGENT 2024-05-09 US claimed
CN-103374708-A High temperature atomic layer deposition of silicon oxide thin films AIR PROD & CHEM 2013-10-30 CN claimed
EP-3805327-B1 ANTIFOULING PAINT COMPOSITION MITSUBISHI CHEM CORP (JP) 2026-04-15 EP disclosed
US-20250277066-A1 Substituted Pyridine-2,6-Bis(Phenylenephenolate) Complexes with Enhanced Solubility that are Useful as Catalyst Components for Olefin Polymerization EXXONMOBIL CHEMICAL PATENTS INC (US) 2025-09-04 US disclosed
EP-3884019-B1 HOME CARE COMPOSITIONS COLGATE PALMOLIVE CO (US) 2025-09-03 EP disclosed
US-20250270698-A1 BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS VERSUM MATERIALS US, LLC 2025-08-28 US disclosed
CN-119213168-A Boron-containing precursors for ALD deposition of boron nitride films 弗萨姆材料美国有限责任公司 2024-12-27 CN disclosed
US-20240150511-A1 WEAK BASE ANION RESIN POLYMERS COMPRISING ALKYLAMINE SEGMENTS AND CROSS-LINKING SEGMENTS, AND THEIR METHODS OF USE IN ION EXCHANGE U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS COLLATERAL AGENT 2024-05-09 US disclosed
US-20240150511-A1 WEAK BASE ANION RESIN POLYMERS COMPRISING ALKYLAMINE SEGMENTS AND CROSS-LINKING SEGMENTS, AND THEIR METHODS OF USE IN ION EXCHANGE U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS COLLATERAL AGENT 2024-05-09 US disclosed
CN-114929937-B Silicon precursor compound, composition for forming silicon-containing film comprising the same, and method for forming silicon-containing film UP化学株式会社 2024-02-06 CN disclosed
WO-2023215694-A1 SUBSTITUTED PYRIDINE-2,6-BIS(PHENYLENEPHENOLATE) COMPLEXES WITH ENHANCED SOLUBILITY THAT ARE USEFUL AS CATALYST COMPONENTS FOR OLEFIN POLYMERIZATION EXXONMOBIL CHEMICAL PATENTS INC. (US) 2023-11-09 WO disclosed
US-20030013656-A1 Pyruvate derivatives ALLOY VENTURES, INC. 2003-01-16 US disclosed
US-20030013846-A1 Pyruvate derivatives ALLOY VENTURES, INC. 2003-01-16 US disclosed
US-20030013847-A1 Cytoprotective agents MONSANTO TECHNOLOGY LLC 2003-01-16 US disclosed
WO-2002090314-A1 PYRUVATE DERIVATIVES GALILEO LABORATORIES, INC. (US) 2002-11-14 WO disclosed
EP-1223161-A2 Method to stabilise and/or lower the color number of alkenyl compounds BASF AKTIENGESELLSCHAFT (DE) 2002-07-17 EP disclosed
US-20020091254-A1 Stabilizing and/or lowering the color number of alkenyl compounds BASF AKTIENGESELLSCHAFT (DE) 2002-07-11 US disclosed
US-6384216-B1 CARRYING OUT TWO DISTILLATIONS IN WHICH THE PURIFIED ALKENYL COMPOUNDS OBTAINED FROM GAS PHASE BY CONDENSATION, WHERE THE TIME BETWEEN FIRST DISTILLATION AFTER SYNTHESIS OF ALKENYL COMPOUNDS AND FURTHER DISTILLATION BASF AKTIENGESELLSCHAFT (DE) 2002-05-07 US disclosed
US-20020038059-A1 PURIFICATION OF ALKENYL COMPOUNDS BASF AKTIENGESELLSCHAFT (DE) 2002-03-28 US disclosed
US-6033819-A FIXABLE COMPONENT HAS A MICRO PHASE SEPARATION STRUCTURE OF A LIQUID CONTINUOUS PHASE AND A DISPERSE PHASE CONTAINING A RESIN AND HAVING A GLASS TRANSITION TEMPERATURE OF NOT HIGHER THAN 20 DEGREES, CONTAINING A BLOCK OR GRAFT POLYMER FUJI XEROX CO., LTD. (JP) 2000-03-07 US disclosed