⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4145778 | 0.93 | — | — | |
| SCHEMBL14686726 | 0.90 | — | — | |
| SCHEMBL14686454 | 0.87 | — | — | |
| SCHEMBL14686589 | 0.87 | — | — | |
| SCHEMBL14686617 | 0.87 | — | — | |
| SCHEMBL14686473 | 0.87 | — | — | |
| SCHEMBL14686465 | 0.87 | — | — | |
| SCHEMBL11016148 | 0.87 | — | — | |
| SCHEMBL14691663 | 0.87 | — | — | |
| SCHEMBL14686522 | 0.87 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8802352-B2 | Salt, photoresist composition and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-08-12 | — | — | US | disclosed |
| US-8741544-B2 | Salt, photoresist composition and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-06-03 | — | — | US | disclosed |
| US-8475937-B2 | Silicone composition and organic light-emitting diode | DOW CORNING CORPORATION (US) | 2013-07-02 | — | — | US | disclosed |
| US-20130052588-A1 | SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-02-28 | — | — | US | disclosed |
| US-20130040239-A1 | SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-02-14 | — | — | US | disclosed |
| EP-2262861-B1 | SILICONE COMPOSITION AND ORGANIC LIGHT-EMITTING DIODE | DOW CORNING (US) | 2012-09-19 | — | — | EP | disclosed |
| US-20110017986-A1 | Silicone Composition and Organic Light-Emitting Diode | DOW CORNING CORPORATION | 2011-01-27 | — | — | US | disclosed |
| EP-2262861-A1 | SILICONE COMPOSITION AND ORGANIC LIGHT-EMITTING DIODE | Dow Corning Corporation (US) | 2010-12-22 | — | — | EP | disclosed |
| US-7687229-B2 | Silver halide color photographic light-sensitive material and image forming method | FUJIFILM CORPORATION (JP) | 2010-03-30 | — | — | US | disclosed |
| WO-2009120434-A1 | SILICONE COMPOSITION AND ORGANIC LIGHT-EMITTING DIODE | DOW CORNING CORPORATION (US) | 2009-10-01 | — | — | WO | disclosed |
| US-7183044-B2 | Silver halide color photographic light-sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-27 | — | — | US | disclosed |
| EP-1524552-A2 | Silver halide color photographic light-sensitive material | Fuji Photo Film Co., Ltd (JP) | 2005-04-20 | — | — | EP | disclosed |
| US-20050069826-A1 | Silver halide color photographic light-sensitive material | FUJI PHOTO FILM CO., LTD. | 2005-03-31 | — | — | US | disclosed |
| US-20040058284-A1 | Silver halide color photographic light-sensitive material | FUJI PHOTO FILM CO., LTD. | 2004-03-25 | — | — | US | disclosed |
| EP-1341035-A2 | Silver halide color photographic light-sensitive material | Fuji Photo Film Co., Ltd. (JP) | 2003-09-03 | — | — | EP | disclosed |
| EP-0324476-B1 | Silver halide color photosensitive materials | FUJI PHOTO FILM CO LTD (JP) | 1995-06-21 | — | — | EP | disclosed |
| US-5242788-A | Improved image storage stability, little staining | FUJI PHOTO FILM CO., LTD. (JP) | 1993-09-07 | — | — | US | disclosed |
| US-5162197-A | Support with hydrophilic colloid layer containing cyan dye forming coupler and solvent; colorfastness, no coloration in background | FUJI PHOTO FILM CO., LTD. (JP) | 1992-11-10 | — | — | US | disclosed |
| US-5057408-A | Coupler solvents | FUJI PHOTO FILM CO., LTD. (JP) | 1991-10-15 | — | — | US | disclosed |
| US-4177213-A | WITH N,N-DIALKYLDITHIOCARBAMIC ACID P-HYDROXY BENZYL ESTERS | CIBA-GEIGY CORPORATION (US) | 1979-12-04 | — | — | US | disclosed |