⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL977269 | 1.00 | — | — | |
| SCHEMBL5416734 | 1.00 | — | — | |
| SCHEMBL5417902 | 1.00 | — | — | |
| SCHEMBL129248 | 0.94 | — | — | |
| SCHEMBL330089 | 0.82 | — | — | |
| SCHEMBL130460 | 0.74 | — | — | |
| SCHEMBL16534583 | 0.67 | — | — | |
| SCHEMBL585520 | 0.67 | — | — | |
| SCHEMBL5041 | 0.67 | — | — | |
| SCHEMBL180919 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 116 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024116575-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, AND RADIATION-SENSITIVE ACID GENERATOR | JSR株式会社 | 2024-06-06 | — | — | WO | disclosed |
| WO-2024116577-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND RADIATION-SENSITIVE ACID GENERATOR | JSR株式会社 | 2024-06-06 | — | — | WO | disclosed |
| WO-2024116576-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND RADIATION-SENSITIVE ACID-GENERATING AGENT | JSR株式会社 | 2024-06-06 | — | — | WO | disclosed |
| WO-2024106020-A1 | RADIATION SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2024-05-23 | — | — | WO | disclosed |
| WO-2024105962-A1 | RADIOACTIVE-RAY-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2024-05-23 | — | — | WO | disclosed |
| US-20240142876-A1 | SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION | JSR CORPORATION (JP) | 2024-05-02 | — | — | US | disclosed |
| WO-2024090041-A1 | RADIOACTIVE-RAY-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2024-05-02 | — | — | WO | disclosed |
| US-11966160-B2 | Radiation-sensitive resin composition and method for forming pattern | JSR CORPORATION (JP) | 2024-04-23 | — | — | US | disclosed |
| CN-113527101-B | Novel compound, polymer, process for producing the same, photosensitive resin composition, pattern forming process, cured film, and electronic component | 信越化学工业株式会社 | 2024-04-23 | — | — | CN | disclosed |
| WO-2024057751-A1 | RADIOACTIVE-RAY-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2024-03-21 | — | — | WO | disclosed |
| US-20040167362-A1 | Process for the hydroformylation of an ethylenically unsaturated compound | SHELL OIL COMPANY | 2004-08-26 | — | — | US | disclosed |
| WO-2004056747-A1 | DHODH-INHIBITORS AND METHOD FOR THEIR IDENTIFICATION | 4SC AG (DE) | 2004-07-08 | — | — | WO | disclosed |
| WO-2004056746-A1 | CYCLOALKENE DICARBOXYLIC ACID COMPOUNDS AS ANTI-INFLAMMATORY, IMMUNOMODULATORY AND ANTI-PROLIFERATORY AGENTS | 4SC AG (DE) | 2004-07-08 | — | — | WO | disclosed |
| EP-1392642-A2 | NOVEL COMPOUNDS AS ANTI-INFLAMMATORY, IMMUNOMODULATORY AND ANTI-PROLIFERATORY AGENTS | 4SC AG (DE) | 2004-03-03 | — | — | EP | disclosed |
| WO-2003006425-A9 | NOVEL COMPOUNDS AS ANTI-INFLAMMATORY, IMMUNOMODULATORY AND ANTI-PROLIFERATORY AGENTS | 4SC AG (DE) | 2004-02-26 | — | — | WO | disclosed |
| US-20030203951-A1 | Novel compounds as anti-inflammatory, immunomodulatory and anti-proliferatory agents | 4SC AG (DE) | 2003-10-30 | — | — | US | disclosed |
| WO-2003006425-A2 | NOVEL COMPOUNDS AS ANTI-INFLAMMATORY, IMMUNOMODULATORY AND ANTI-PROLIFERATORY AGENTS | 4SC AG (DE) | 2003-01-23 | — | — | WO | disclosed |
| US-6344471-B1 | DIISOPROPYL FLUOROPHOSPHATE (DFP), TREATMENT OF COGNITIVE DISORDERS, DEPRESSION, SCHIZOPHRENIA AND ANXIETY. | BAYER AKTIENGESELLSCHAFT (DE) | 2002-02-05 | — | — | US | disclosed |
| EP-1087950-A1 | NEW 2-AMINOCARBONYL-5(2H)-ISOXAZOLONES AS LIGANDS OF A DFP-BINDING SITE FOR TREATMENT OF CNS-DISEASES | BAYER AG (DE) | 2001-04-04 | — | — | EP | disclosed |
| WO-1999067229-A1 | NEW 2-AMINOCARBONYL-5(2H)-ISOXAZOLONES AS LIGANDS OF A DFP-BINDING SITE FOR TREATMENT OF CNS-DISEASES | BAYER AKTIENGESELLSCHAFT (DE) | 1999-12-29 | — | — | WO | disclosed |