SCHEMBL9756616

SCHEMBL9756616

[As-3].[La+3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29377737 0.71
Ammonia Solution, Strong SCHEMBL27759854 0.71
SCHEMBL29388660 0.71
SCHEMBL28363565 0.71
SCHEMBL5967825 0.50
SCHEMBL139031 0.50
SCHEMBL9229774 0.50
SCHEMBL10802613 0.50
SCHEMBL417939 0.50
Lithium Ion SCHEMBL2020200 0.50

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122061256-A Low-defect indium arsenide monocrystal and preparation process thereof 青岛浩瀚全材半导体有限公司 2026-05-19 CN disclosed
US-5037770-A Process for the production of a field effect transistor using a lanthanum arsenide contact layer FRAUNHOFER-GESELLSCHAFT ZUR FORDERUNG DER ANGEWANDTEN FORSCHUNG E.V. (DE) 1991-08-06 US disclosed
US-4882206-A Chemical vapor deposition of group IIIB metals GEORGIA TECH RESEARCH CORPORATION (US) 1989-11-21 US disclosed
EP-0025668-B1 PROCESS FOR PURIFYING GROUP III ELEMENTS AND EPITAXIAL GROWTH OF SEMICONDUCTOR COMPOUNDS THE POST OFFICE (GB) 1983-11-02 EP disclosed
US-4339302-A PURIFYING GROUP 3A ELEMENT MIXED WITH GROUP 6A ELEMENT THE POST OFFICE (GB) 1982-07-13 US disclosed
EP-0025668-A1 Process for purifying group III elements and epitaxial growth of semiconductor compounds THE POST OFFICE (GB) 1981-03-25 EP disclosed