Pentachlorophenol

Pentachlorophenol

SCHEMBL9757557

F.Oc1c(Cl)c(Cl)c(Cl)c(Cl)c1Cl.[Ta]

nearest known ligand 0.83

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HSD17B10 Q99714 8/20 0.83
▸ TSHR P16473 7/20 0.83
▸ HPGD P15428 7/20 0.83
▸ ALDH1A1 P00352 3/20 0.83
▸ MEN1 O00255 2/20 0.83
▸ LMNA P02545 2/20 0.83
▸ MAPT P10636 2/20 0.83
▸ KMT2A Q03164 2/20 0.83
▸ CYP1A2 P05177 4/20 0.48
▸ CYP2C9 P11712 4/20 0.48
▸ HIF1A Q16665 3/20 0.48
▸ CASP1 P29466 1/20 0.44
▸ CYP2C19 P33261 1/20 0.42
▸ MAPK1 P28482 3/20 0.40
▸ CYP3A4 P08684 5/20 0.38
▸ USP2 O75604 1/20 0.38
▸ TP53 P04637 1/20 0.38
▸ GLA P06280 1/20 0.38
▸ THRB P10828 1/20 0.38
▸ ALOX15 P16050 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Pentachlorophenol SCHEMBL4462648 0.96 HSD17B10 (0.91) HSD17B10TSHRHPGDALDH1A1MEN1
Pentachlorophenol SCHEMBL6026292 0.96 HSD17B10 (0.91) HSD17B10TSHRHPGDALDH1A1MEN1
Pentachlorophenol SCHEMBL9851424 0.92 HSD17B10 (0.83) HSD17B10TSHRHPGDALDH1A1MEN1
Pentachlorophenol SCHEMBL10440272 0.92 HSD17B10 (0.83) HSD17B10TSHRHPGDALDH1A1MEN1
Pentachlorophenol SCHEMBL9852185 0.92 HSD17B10 (0.83) HSD17B10TSHRHPGDALDH1A1MEN1
Pentachlorophenol SCHEMBL10696385 0.92 HSD17B10 (0.83) HSD17B10TSHRHPGDALDH1A1MEN1
Pentachlorophenol SCHEMBL10626315 0.92 HSD17B10 (0.83) HSD17B10TSHRHPGDALDH1A1MEN1
Pentachlorophenol SCHEMBL15329277 0.92 HSD17B10 (0.83) HSD17B10TSHRHPGDALDH1A1MEN1
Pentachlorophenol SCHEMBL23121452 0.91 HSD17B10 (1.00) HSD17B10TSHRHPGDALDH1A1MEN1
Pentachlorophenol SCHEMBL1330735 0.91 HSD17B10 (1.00) HSD17B10TSHRHPGDALDH1A1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9558937-B2 Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium HITACHI KOKUSAI ELECTRIC INC. (JP) 2017-01-31 — — US disclosed
US-9530641-B2 Method for manufacturing semiconductor device, substrate processing apparatus, and recording medium HITACHI KOKUSAI ELECTRIC INC. (JP) 2016-12-27 — — US disclosed
US-20160042940-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM HITACHI KOKUSAI ELECTRIC INC. (JP) 2016-02-11 — — US disclosed
US-9187826-B2 Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium HITACHI KOKUSAI ELECTRIC INC. (JP) 2015-11-17 — — US disclosed
US-20150303054-A1 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM HITACHI KOKUSAI ELECTRIC INC. (JP) 2015-10-22 — — US disclosed
US-9006116-B2 Method of manufacturing semiconductor device, substrate processing method and substrate processing apparatus HITACHI KOKUSAI ELECTRIC INC. (JP) 2015-04-14 — — US disclosed
US-20150093911-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM HITACHI KOKUSAI ELECTRIC INC. (JP) 2015-04-02 — — US disclosed
US-8822350-B2 Method of manufacturing semiconductor device, substrate processing method and substrate processing apparatus HITACHI KOKUSAI ELECTRIC INC. (JP) 2014-09-02 — — US disclosed
US-20140099797-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS HITACHI KOKUSAI ELECTRIC INC. (JP) 2014-04-10 — — US disclosed
US-20130280919-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS HITACHI KOKUSAI ELECTRIC INC. (JP) 2013-10-24 — — US disclosed
EP-0420916-A1 CATALYZED HYDROFLUORINATION PROCESS. DU PONT (US) 1991-04-10 — — EP disclosed
WO-1989012615-A1 CATALYZED HYDROFLUORINATION PROCESS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1989-12-28 — — WO disclosed
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